Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Volkswagen Ag

Michael Thomas

Claus-Peter Klages

Thorben Günzel

Frank Schwitters

Antje Zanker

Thomas Neubert

Eugen Schlittenhardt

Tim Gyung-Min Abraham

Antje Dohse

Kristina Lachmann

The invention relates to a plasma stamp, with which surfaces can be subjected to a plasma treatment. In addition, the invention relates to a plasma treatment device, with which surfaces can be subjected to a plasma treatment, and also a plasma treatment method. In addition, the invention relates to a method for producing a plasma stamp.

Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp

The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film. Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the surface having microstructured depressions, a planar high-voltage electrode the surface of which has a shape complementary to that of the cylindrical electrode and can be arranged on a section of the surface of the cylindrical electrode in a substantially form-fit manner, a transport device for transporting the film substrate to be treated between the surface of the cylindrical electrode and the high-voltage electrode, and a device for feeding a process gas to the surface of the cylindrical electrode and to the interspace between the cylindrical electrode and the high-voltage electrode.

Device and method for microstructured plasma treatment

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Lehrte, Germany

Michael Thomas