Dr. Johannes Heidenhain Gmbh

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Michael Stepputat

Wolfgang Holzapfel

Johann Mitterreiter

Markus Meissner

Florian Schindler

Siegfried Reichhuber

Robert Kraus

Gerhard Vogt

Reinhard Noll

Florian Garczarek

Robert Sturm

Joel Heersink

Robert Metzke

Bernhard Pletschacher

Manuel Scherer

Markus Meißner

Markus Scherer

Manuuel Scherer

Stefan Birnbacher

Markus Eberl

Volker HÖFER

A measuring device includes a movable probe head and an optical position sensing device for determining the spatial position and orientation of the probe head relative to a reference point. The position sensing device includes at least three position determination modules, arranged as a transmission unit or as a receiving unit, at least one position determination module being situated on the probe head, and at least one position determination module being situated at the reference point. A transmission unit has transmission unit marking element(s). A receiving unit includes optoelectronic detector(s) and receiving unit marking element(s), positioned in a defined spatial relationship relative to the optoelectronic detector. Visual contacts exist between at least some of the position determination modules. The position determination module on the probe head and the position determination module at the reference point are connected by at least one uninterrupted chain of visual contacts.

Measuring device

An optical distance-measuring device includes a light source, and an interferometer unit having a measuring retroreflector, stationary reference retroreflector, beam-splitter element, beam-recombiner unit, and detection unit. The beam of rays emitted by the light source swivels about the center of the reference retroreflector. The beam of rays arriving from the light source splits via the beam-splitter element into a measuring beam and reference beam. The measuring beam propagates in the direction of the measuring retroreflector, and the reference beam propagates collinearly with the measuring beam in the direction of the reference retroreflector. The measuring beam is reflected back by the measuring retroreflector and the reference beam is reflected back by the reference retroreflector in the direction of the beam-recombiner unit, the measuring beam traveling symmetrically relative to the reference retroreflector prior to and after reflection at the measuring retroreflector.

Optical distance-measuring device

A position measuring arrangement that includes a retroreflector, a light source generating a lightbeam and a scanning unit that generates a partially-divergent lightbeam. The scanning unit includes a scanning mirror mounted so it is deflected in a reproducible manner so that a grid-like scanning of a two-dimensional spatial area by the partially-divergent lightbeam takes place over a plurality of scanning tracks. The position measuring arrangement including an interferometric distance measuring unit that includes a beam splitter element that splits the lightbeam generated by the light source so that split lightbeams pass through a reference arm and a measuring arm at least once in each direction. The interferometric distance measuring unit includes an opto-electronic detector unit, through which a detection of distance-dependent signals from superimposed lightbeams from the reference arm and the measuring arm takes place.

Position measuring arrangement

The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval &#x394;T, that prior to the plasma generation, additional geometric parameters P1, P2 . . . PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1 . . . T2].

Method and device for carrying out emission spectrometry

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Traunstein, Germany

Michael Stepputat