Carl Zeiss Nts Gmbh

Carl Zeiss Microscopy Gmbh

Carl-zeiss-smt Ag

Alis Corporation

Leo Elektronenmikroskopie Gmbh

Carl Zeiss Nis Gmbh

Michael Steigerwald

Dirk Preikszas

John Anthony Notte, Iv

Billy W Ward

Raymond Hill

Rainer K Knippelmeyer

Randall G Percival

Josef Biberger

Louis S Farkas, Iii

Stephan Uhlemann

Oliver Kienzle

Ralph Pulwey

Volker Drexel

Dietmar Doenitz

Erik Essers

Ulrich Mantz

Christian Hendrich

Heiko Müller

Jaroslaw Paluszynski

Momme Mommsen

John A Notte

Peter Hoffrogge

Peter Gnauck

Dirk Stenkamp

Dietmar Dönitz

Max Haider

Hans Mathèe

Joerg Ackermann

Dirk Preixszas

Daniel Tobias

Andreas Eisele

Peter Dipl-Phys Hoffrogge

Jörg Ackermann

Louis Farkas

A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.

Method of processing of an object

Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size f at the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least d in the first direction, and a ratio d/f being 2 or more.

Scanning charged particle beams

A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side.

Positioning device for a particle beam apparatus

A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.

Particle optical device with magnet assembly

Ion sources, systems and methods are disclosed.

Ion sources, systems and methods

There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one particle beam passing the beam splitter. The beam splitter is, in first order, free of dispersion, astigmatism and distortion.

Particle-optical arrangements and particle-optical systems

An electron microscopy system and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface and electrons emanating from the sample surface are detected, time resolved. To this end the system comprises in particular a cavity resonator. A cavity resonator can also be used to reduce aberrations of focusing lenses.

Electron microscopy system, electron microscopy method and focusing system for charged particles

An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same

An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.

Objective lens for an electron microscopy system and electron microscopy system

An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source

Growing community of inventors

Westhausen, Germany

Michael Steigerwald