Zygo Corporation

Michael Schroeder

Peter J De Groot

Leslie Ludwig Deck

Henry Allen Hill

Andrew Eric Carlson

An encoder interferometry system includes a beam splitting element positioned to receive an input beam from a light source, in which the beam splitting element is configured to direct a first portion of the input beam along a measurement path to define a measurement beam and a second portion of the input beam along a reference path to define a reference beam, an encoder scale positioned to diffract the measurement beam at least once, one or more optical components configured and arranged to alter a direction of a first diffracted portion of the measurement beam and a direction of a second diffracted portion of the measurement beam such that beam paths of the first diffracted portion and the second diffracted portion are non-parallel subsequent to the first diffracted portion and the second diffracted portion passing through the beam splitting element, and a detector positioned to receive the first diffracted portion.

Interferometric heterodyne optical encoder system

A method for determining information about changes along a degree of freedom of an encoder scale includes directing a first beam and a second beam along different paths and combining the first and second beams to form an output beam, where the first and second beams are derived from a common source, the first and second beams have different frequencies, where the first beam contacts the encoder scale at a non-Littrow angle and the first beam diffracts from the encoder scale at least once; detecting an interference signal based on the output beam, the interference signal including a heterodyne phase related to an optical path difference between the first beam and the second beam; and determining information about a degree of freedom of the encoder scale based on the heterodyne phase.

Interferometric encoder systems

An encoder interferometry system includes an interferometer positioned to receive first and second beams having different frequencies, in which the interferometer has at least one polarizing beam splitting element for directing the first beam along a measurement path to define a measurement beam and the second beam along a reference path to define a reference beam. The encoder interferometry system further includes a encoder scale positioned to diffract the measurement beam at least once, a detector positioned to receive the measurement and reference beams after the measurement beam diffracts from the encoder scale, and an output component positioned to receive the measurement and reference beams before they reach the detector and deflect spurious portions of the first and second beam away from the detector.

In general, in one aspect, the invention features an interferometer assembly for use in a lithography tool used for fabricating integrated circuits on a wafer, wherein the lithography tool includes a support structure and a stage for positioning the wafer relative to the support structure, the interferometer assembly including an interferometer configured to direct a measurement beam between the stage and the support structure and combine the measurement beam with another beam to form an output beam which includes a phase related to a position of the stage relative to the support structure, wherein the interferometer is mechanically secured to the lithography tool through an interferometer surface selected to cause the phase of the output beam to be insensitive to thermal changes of the interferometer over a range of temperatures.

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East Hampton, CT, United States of America

Michael Schroeder