Other

Johnson and Johnson Vision Care, Inc.

Carl-zeiss-smt Ag

Michael Schottner

Josef F Bille

Denwood F Ross

Frank Mueller

Martin Lowisch

Bjorne Baschek

Bjoern Baschek

An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wave front deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.

Groupwise corrected objective

Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.

Ophthalmic wavefront measuring devices

Defocus and astigmatism compensation methods and apparatuses for use in an aberration measurement system. The apparatuses including reflectors for altering the optical distance between a pair of lenses passing a wavefront without changing the physical distance between the lenses, thereby compensating for defocus in the wavefront; and cylindrical mirrors for adding and removing curvature from a curved wavefront, thereby compensating for astigmatism in the wavefront. The methods including passing a wavefront having defocus through a first lens on a first path, reflecting the wavefront from the first path to a second path, reflecting the wavefront from the second path to a third path, and passing the wavefront through a second lens as a defocus compensated wavefront; and passing a wavefront through first and second cylindrical lens, and orienting the first and second cylindrical lenses with respect to the wavefront and to one another to compensate for astigmatism in the wavefront.

Defocus and astigmatism compensation in a wavefront aberration measurement system

Apparatus and method for subjectively refining a corrective prescription based on feedback from a patient. Subjective refinement of a corrective prescription is accomplished by measuring aberrations of a wavefront emanating from the eye, computing a proposed corrective prescription based on the measured aberrations presenting to the patient an image reflecting the proposed corrective prescription, and varying the proposed corrective prescription based on feedback from the patient through an input device coupled to the processor to obtain the preferred corrective prescription.

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Leimen, Germany

Michael Schottner