Carl Zeiss Microscopy Gmbh

Carl Zeiss Smt Gmbh

Michael Schnell

Dirk Preikszas

Christian Hendrich

Momme Mommsen

Edgar Fichter

Joerg Fober

Michael Budach

Bernd Schindler

Markus Boese

Kai Schubert

Michel Aliman

Lorenz Lechner

Klaus Hegele

A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

Methods and devices for examining an electrically charged specimen surface

The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

High-voltage supply unit and circuit arrangement for generating a high voltage for a particle beam apparatus

The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Particle beam apparatus and method for operating a particle beam apparatus

A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

Particle beam device comprising an electrode unit

A particle beam device and a method for analyzing and/or treating an object is disclosed. According to the described system, the position of a crossover on an optical axis of a particle beam device can be freely adjusted, even in the case of a fixed extractor potential and a fixed high voltage. The particle beam device has a first electrode unit with three electrode apparatuses, a second electrode unit with three electrode apparatuses, and an acceleration unit. The method according to the system described herein uses the particle beam device.

Particle beam device and method for analyzing and/or treating an object

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Rechberghausen, Germany

Michael Schnell