Leybold Optics Gmbh

BÜhler Alzenau Gmbh

Michael Scherer

Jurgen Pistner

Harro Hagedorn

Gerd Deppisch

Walter Lehnert

Mario Roder

Michael Klosch-Trageser

Mario Röder

Jürgen Pistner

Walter Lehrnert

A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Method for producing a multilayer coating and device for carrying out said method

The invention concerns an optical coating ('), having a high refractive index and good optical properties (i.e., low absorption and scatter) and limited internal stresses in a spectral range extending from the visible to the near UV range (i.e., up to a wavelength of 220 nm). The coating (&#x2032;) according to the invention consists of a hafnium- or zirconium-containing oxide HfSiOor ZrSiOcontaining an silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.

Hafnium or zirconium oxide coating

The invention relates to an apparatus () for producing a reflection-reducing layer on a surface () of a plastics substrate (). The apparatus comprises a first sputtering device () for applying a base layer () to the surface () of the plastics substrate (), a plasma source () for plasma-etching the coated substrate surface (), and a second sputtering device () for applying a protective layer () to the substrate surface (). These processing devices () are arranged jointly in a vacuum chamber (), which has inlets () for processing gases. In order to move the substrate () between the processing devices () in the interior of the vacuum chamber (), a conveying apparatus () is provided which is preferably in the form of a rotary table (). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface () of the plastics substrate ().

Method and apparatus for producing a reflection-reducing layer on a substrate

The invention relates to a test glass changing system () for selectively coating and optically measuring a test glass (&#x2033;) in a coating chamber () of a vacuum coating installation (). In the coating chamber, a movable turntable () is used to guide substrates () on a path through a stream of a coating material. The test glass changing system () comprises a test glass holder (&#x2033;) with a test glass plate () for holding the test glass (&#x2033;), and a cover (&#x2033;) for selectively covering the test glass plate (). The test glass changing system () also comprises a rotary apparatus () for rotating the test glass plate () about an axis () which is oriented approximately parallel to the axis of rotation () of the turntable (). The test glass holder (&#x2033;) can be positioned on the turntable () and removed from the coating chamber () in the form of a unit.

Test glass changing system

A plasma source generates a plasma beam that is extracted from a plasma generated by electric and magnetic fields. An RF electrode device includes an excitation electrode having an excitation area, and a plasma space is arranged between extraction electrode and excitation area. The plasma, relative to the extraction electrode is at a higher potential which accelerates positive plasma ions, and the plasma and the extracted plasma beam are influenced by a magnetic field. At least one magnet north pole and one magnetic south pole generate the magnetic field. Each are arranged such that a curved magnetic field projecting into the interior of the plasma space is formed. At least one of the north or south poles is embodied in elongate fashion to form a tunnel-like region in the plasma, in which charged particles are held and along which the latter can propagate.

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Kahl, Germany

Michael Scherer