Leybold Aktiengesellschaft

Leybold-heraeus Gmbh

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Unaxis Trading Ag

Balzers Prozess Systeme Gmbh

Balzers Prozess-systems Gmbh

Balzers Prozeb-systeme Gmbh

Glyco-metal Werke

Hans Zapfe

Michael Scherer

Peter Mahler

Rudolf Latz

Ulrich Patz

Joachim Szczyrbowski

Klaus Hartig

Anton Dietrich

Klaus Michael

Rainer Gegenwart

Wolfram Maass

Roland Werner

Roland Gesche

Michael Geisler

Willi Neff

Michael Jung

Bernd Hensel

Jochen Ritter

Wolf-Dieter Munz

Manfred Arnold

Gunter Brauer

Otto Knotek

Klaus Pochner

Wolfgang Stang

Gerhard Hessberger

Guido Blang

Michael Schanz

Rudolph Latz

Gerhard Moses

Oliver Burkhardt

Karl-Heinz Kubacha

Werner Lenz

A workpiece holding device for a vacuum unit has coolable or heatable transfer plates ( ) displaceable independently of one another in a baseplate ( ) and each comprising a heat transfer surface ( ) which is surrounded by an O-ring ( ), is connected to a pipe ( ) and, with a workpiece ( ) which is pressed against the O-ring ( ) by a holder ( ), encloses a gap ( ). The holder ( ) can be locked to the baseplate ( ). After lowering of the holder ( ) into a closed position and load-free locking to the baseplate ( ), the heat transfer plates ( ) are pneumatically raised until in each case a stop ( ) becomes effective between said heat transfer plates and the holder ( ) and determines the width of the gap ( ). The gap ( ) is then filled via the pipe ( ) with a heat transfer medium, e.g. helium. After processing of the workpiece ( ), the heat transfer plates ( ) are lowered and the holder ( ) is released again in a loadfree manner.

Heat-exchanging workholder for a vacuum unit

In an apparatus for coating substrates (9), especially with magnetizable materials such as NiFe, with a circular, disk-shaped, rotatably supported substrate holder (3), which is subjected to an HF bias voltage, which is provided around its circumference and on the back with dark-space shield (1), and which rotates under at least one opposing cathode (7), and with a device for generating a magnetic field (13) parallel to the plane of the substrate (9), the magnetic field is generated by an electromagnet, the exciter coil of which, together with the lower part of the yoke (10), is housed in the dark-space shield (1), whereas the extended pole pieces (12, 12'), which are electrically insulated from the coil yoke (10) via the dark space gap (2), are housed in the substrate holder (3) in proximity to the substrate (9).

Apparatus for coating substrates especially with magnetizable materials

In a moisture sensor (1), the effective sensor field (4) is formed by two sensor elements (8a, 8b,) having interdigitating parallel tracks. These sensor elements consist of layers of a metal nitride compound, especially a chromium-nitrogen compound, deposited by means of magnetron cathode sputtering or glow discharge onto a dielectric substrate (2), the metal nitride layers being deposited onto the substrate surface which has first been cleaned by ion sputtering. These sensor element layers (8a, 8b) have a high hardness of about 2,000 on the Vickers scale, as a result of which the sensor elements (8a, 8b) are highly resistant to abrasive wear such as that caused by windshield wipers or scratching from ice. The moisture sensor can be produced with a low electrical surface resistivity of &lt;100 ohms.quadrature. and is chemically stable with respect to environmental effects such as salt water and/or windshield cleaning fluids. As a result, the proposed moisture sensor is especially suitable for use as a rain sensor on vehicles, the rain sensor preferably being mounted on a window of the vehicle.

Rain sensor

A pot-shaped hollow target (4) is open toward the substrate (3) that is to be coated, a dark-space shield (6) surrounds the lateral wall (5) of the target (4), and a cathode base body (11) is supported on an insulator (8) on the roof (9) of the vacuum chamber (2) and is connected electrically to a power source (10). A magnet belt (12) formed of a plurality of magnets (18, 18') surrounds the dark-space shield (6). A turntable (15) having an axis of rotation (16) parallel to and offset from the target's (4) perpendicular plane of symmetry (17) is provided for holding the substrates (3).

Apparatus for coating substrates by cathode sputtering with a hollow

A pot-shaped hollow target (4) open toward the substrate (3) to be coated is surrounded by a dark-space shield (7) adjacent the lateral wall (5) of the target (4), and a cathode base body (11) is supported on an insulator (9) on the roof (10) of the vacuum chamber (2) and connected electrically to a power source (6). A hanger (15) reaches through a central opening (12) in the cathode base body (11) and through a central opening in the top (8) of the target (4) and is supported on the cathode base by an insulator (14), and holds a disk (16) shielding the top (8) of the target (4). A motor-driven turntable (18) forms the substrate holder (17), whose axis of rotation (19) is parallel to but offset laterally from the plane of symmetry (20) of the target by an amount (A).

A barrier discharge device (4a, 4b, 4c) installed in a vacuum chamber (1) consists essentially of at least two facing electrodes (20, 22); a dielectric (22) situated between the electrodes (20, 22) and in the immediate proximity of one of these electrodes (20); and a power source (26), which is connected electrically to the electrodes (20, 22). The plasma particles and UV radiation generated during the electrical discharge between the electrodes (20, 22) pass through the electrode (22), which is permeable to UV radiation and plasma particles, and thus emerge from the discharge space. On the surfaces (5a, 5b), the UV radiation induces a photochemical cleaning process, and the impinging plasma particles induce a plasma-chemical cleaning process. The cleaning process is essentially independent of pressure and can be used at pressures of up to 10 bars, which means that the cleaning process can be operated in particular during the time in which the vacuum chamber (1) is being pumped out.

Process for cleaning a substrate using a barrier discharge

Method for manufacturing a rain sensor

In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.

Dual cathode sputter coating apparatus

The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.

Arrangement for coating substrates

A pair of magnetron cathodes in an evacuable coating chamber are connected to the outputs of the secondary winding of a transformer, the primary winding being connected to the outputs of a medium frequency A.C. generator. An oval target is mounted on each cathode and surrounded by stainless steel bars. As an alternative the bars may be configured as plates connected to ground and mounted to the target by insulating spacers.

Apparatus for coating a substrate by magnetron sputtering

A vacuum coating apparatus has a pot-like tank (2) against whose open side a portion of a substrate (1) can be held sealingly. In the tank (2) there is disposed a target (7). A shut-off plate (9) makes it possible after lowering the substrate (1) to hold this target (7) under vacuum in a source chamber (11) protected against intrusion of air.

Vacuum coating apparatus

The invention relates to a sputtering unit with an electrode (3) and a target (2) connected with this electrode (3) wherein this target (2) is interchangeable. Herein a consumed target (2) is replaced by a fresh and pre-sputtered target (7) thereby that the complete electrode (3) is replaced by a new electrode (6).

Sputtering unit

A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.

Apparatus for the reactive coating of a substrate

The invention relates to an arrangement for the vapor deposition of thin layers on a substrate. This arrangement comprises a magnetron cathode with a target disposed opposite the substrate. With the aid of a particle generator ions of a reactive gas are generated and accelerated toward the substrate where a reaction takes place between target particles and reactive gas particles.

Arrangement for the coating of substrates

In a device for transporting substrates in vacuum coating systems with several stations, comprising several substrate holders 16 of plate-like configurations which can e moved across the stations along a prescribed path of transportation in a vertical position and which interact with rails 13, 14 being provided in the area of their foot part 15 below the substrates 22, 23 to be mounted to the substrate holders 16, the foot part 15 of the substrate holder 16 has a pair of rails 13, 14 spaced parallel apart and disposed in a vertical plane. The smaller sides thereof, which face one another, have longitudinal grooves 13a, 14 which correspond with rollers 7, 8 or sliding pads being disposed stationary on the bottom part of the device and being provided in rows corresponding to the course of the grooves and in planes that are on top of each other and spaced vertically apart. The substrate holder 16 has a shaft-like recess 24 which extends from the top downward into the area of the foot part 15 parallel to the rails and into which, while passing the station, extends a flat heating device 11 extending vertically toward the bottom and disposed above the substrate holder 16 at the top wall part 4a. The substrate holder 16 surrounds the heating device 11 in a U-shaped manner.

Growing community of inventors

Rodenbach, Germany

Michael Scherer