Olin Corporation

Michael Scardera

Frank R Grosser

Thomas S Roche

David F Gavin

Robert N Scott

Arthur R Vanover

Tom S Targos

Theodore Groom

Henry S Bunch

John A Wojtowicz

James M O'Connor

Richard M Mullins

Richard L Doerr

John G Bayusik

Frank S Natoli

Alan Norwid

Jimmie Floyd

Garrett B Schifilliti

Thomas Stephen Roche

The present invention relates to a poly(oxyalkylated) alcohol composition represented by the formula:

Biodegradable low foaming surfactants as a rinse aid for autodish

Biogradable low foaming surfactants as a rinse aid for autodish

The present invention relates to novel compounds represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, n has a value from 1 to 6, R.sub.1 is selected from the group consisting of an alkyl group having from 1 to about 12 carbon atoms, H, or ##STR2## wherein the sum of n-m=3 to 12, Z.dbd.H or SO.sub.3 M and M.dbd.NH.sub.4, Na, or K. These compounds possess antimicrobial activity and are useful as cleaning agents and preservatives, particularly in water-base functional fluids and surface coating compositions.

Polyglycidol sulfated surfactants having antimicrobial activity

The present invention relates to novel compounds represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, n has a value of from 1 to 6, R.sub.1 is selected from the group consisting of an alkyl group having from 1 to about 12 carbon atoms, or ##STR2## where the sum of n+m=2 to 12. These compounds possess antimicrobial activity and are useful as cleaning agents and preservatives, particularly in water-based functional fluids and surface coating compositions.

Polyglycidol amine oxide surfactants having antimicrobial activity

Novel nonionic antimicrobial amine glycidol compounds which may be used in cleaning compositions with anionics, nonionics or cationic surfactants as cleaning agents or a preservative in water-based functional fluids or surface coating compositions are represented by the formula: ##STR1## wherein R represents an alkyl group having from about 8 to about 18 carbon atoms and mixtures thereof,

Anti-microbial composition containing aliphatic polygycidol adducts

Novel nonionic antimicrobial amine glycidol compounds which may be used in cleaning compositions with anionics, nonionics or cationic surfactants as cleaning agents or a preservative in water-based functional fluids or surface coating compositions are represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, R.sub.1 is selected from the group consisting of benzyl or an alkyl group having from 1 to about 12 carbon atoms, X is Cl, Br, or I, and n and m are from 1 to about 6.

Antimicrobial composition containing quaternary aliphatic amine

Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of an anionic sulfate ester of alkylphenol polyglycidol ether. Preferred embodiments of the anionic sulfate esters of alkylphenol polyglycidol ethers may be represented by the formula: ##STR1## wherein R represents an alkyl group having from about 4 to about 12 carbon atoms, x is from about 3 to about 15, M represents H, an alkali metal, an alkaline earth metal, ammonium, or an amine, and y is from 0.2 to about 4. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF to from about 3:1 to about 50:1. The novel etching solutions of the present invention have excellent wetting characteristics and retain their wetting properties after extended periods of continuous filtration through sub-micron filters.

Etching solutions containing ammonium fluoride and anionic sulfate

Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl amine glycidol adduct. Preferred embodiments of the nonionic alkyl amine glycidol adducts employed in the etching solution of the present invention are those represented by the formulas: ##STR1## wherein R represents an alkyl group having from about 8 to about 18 carbon atoms and mixtures thereof,

Etching solutions containing ammonium fluoride and a nonionic alkyl

Described are anionic surfactants which are made by (1) reacting maleic acid, fumaric acid, itaconic acid or mixtures thereof with at least one selected epoxy-capped poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) neutralizing said addition product with a sufficient amount of a neutralizing agent to convert at least a major proportion of said carboxylic acid groups to salt groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Anionic surfactants

Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl polysaccharide having the formula:

Etching solutions containing ammonium fluoride and an alkyl

Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkylphenol polyglycidol ether having the formula: ##STR1## wherein R is an alkyl group having from about 4 to about 12 carbon atoms, and x is from about 3 to about 15. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF of from about 3:1 to about 50:1. The novel etching solutions of the present invention have excellent wetting characteristics, will not incorporate metallic ions, and retain their wetting properties after extended periods of continuous filtration.

Etching solutions containing ammonium fluoride and an alkylphenol

A calcium hypochlorite-containing emulsion having an emulsifying agent which comprises an oil soluble ethylene oxide adduct of an alkylphenol having from about 4 to about 7 moles of ethylene oxide and an oil soluble alkyl aryl sulfonate in a chlorinated organic solvent. This emulsion is suitable for decontaminating areas, structures and articles which have been contaminated with toxic chemical agents. The emulsion can be prepared from calcium hypochlorite compounds made from a wide variety of processes and can be used over a broad rang of climatic conditions. The emulsions are consistently formed very rapidly and can spread, penetrate and remain stable for sufficient amounts of time to provide complete neutralization of the contaminating agent.

Toxic chemical agent decontamination emulsions, their preparation and

Described are anionic surfactants which are made by (1) reacting maleic acid or fumaric acid, or mixtures thereof with at least one selected poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) neutralizing said addition product with a sufficient amount of a neutralizing agent to convert at least a major proportion of said carboxylic acid groups to salt groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Anionic surfactant addition products of maleic or fumaric acid and a

Described are anionic surfactants which are made by (1) reacting maleic acid, fumaric acid, or mixtures thereof with at least one selected poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) sulfating said addition product with a sufficient amount of a sulfating agent (i.e. sulfamic acid) to convert at least a major proportion of the terminal hydroxyl groups to sulfate groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Sulfated addition products of selected unsaturated dicarboxylic acids

Disclosed is a stable emulsion system which comprises:

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Hamden, CT, United States of America

Michael Scardera