Celestech, Inc.

Saint-gobain/norton Industrial Ceramics Corporation

Saint-gobain Industrial Ceramics, Inc.

Michael S Heuser

Cecil B Shepard, Jr

Matthew A Simpson

Daniel V Raney

William A Quirk

Henry Windischmann

Stephen M Jaffe

Donald O Patten, Jr

Gregory Bak-Boychuk

C B Shepard, Jr

George Quirk

An apparatus for depositing synthetic diamond on a surface of a substrate includes a deposition chamber and a cooling block having a surface in the deposition chamber that is cooled by heat exchange. The substrate is supported from the cooling block so that the bottom surface of the substrate is spaced from the cooling block surface by a gap, and a gas is provided in the deposition chamber and in the gap, the gas comprising at least 30 percent hydrogen gas. A plasma deposition system forms in the chamber a plasma containing hydrogen gas and a hydrocarbon gas for depositing synthetic diamond on the top surface of the substrate.

Apparatus and method for depositing a substance with temperature control

A gas injection disc is provided which includes an outer ring and a tubular modular insert which slips into the outer ring. The outer ring is provided with an inner bore, a ring-shaped plenum located around the inner bore, an outer gas sealing surface around the plenum, and two gas feed paths extending from the periphery of the outer ring to the plenum. The gas feed paths are each provided with a gas feed attachment for coupling gas supply tubes thereto. The insert is provided with a plurality of radially aligned injectant holes, an inner gas sealing surface, and an axial bore. The insert is seated in the inner bore of the outer ring such that the inner and outer gas sealing surface face each other with a small gap provided therebetween which enables the insertion of the insert into the inner bore. The insert thereby substantially encloses the plenum, and the injectant holes are aligned with the plenum to receive injectant gases and direct the injectant gases into the axial bore of the insert. During the CVD process, the heat generated by the arc jet causes the insert to expand and eliminate the gap between the inner and outer sealing surfaces to thereby prevent undesirable gas leakage. Once the CVD operation is stopped the insert is permitted to cool and contract and return to its cooled dimensions unencumbered by the outer ring. The insert may then be removed for cleaning or for replacement with an insert having different characteristics.

Gas injection disc assembly for CVD applications

A radiation and regeneratively cooled arc jet device includes improvements designed to provide higher gas enthalpy operation for thin diamond film deposition. A series of circumferentially and axially spaced gas injection holes are provided in the cylindrical inner walls of the arc chamber between a cathode and anode. This arc chamber wall is fabricated from a material having a high thermal shock parameter. The ratio of the spacing of the injection holes within each row as compared to the chamber diameter is set within a specific range. In the circumferential direction, a multiplicity of axial rows of holes are provided and spaced equally about the circumference of the chamber. The annular anode is isolated at the open end of the arc chamber by an insulator having a high thermal shock parameter, to conduct anticipated heat loads without mechanical failure.

Radiation and regeneratively cooled arc jet device for thin diamond film

A method is disclosed for depositing diamond film, including the following steps: providing an environment comprising hydrogen gas and a hydrocarbon gas; dissociating hydrogen gas of the environment by dielectric barrier discharge to obtain atomic hydrogen; and providing a deposition surface in the environment and implementing diamond deposition on the deposition surface from the hydrocarbon gas, assisted by the atomic hydrogen. In a preferred embodiment, the atomic hydrogen is transported by molecular diffusion from its dissociation site to the deposition surface.

Method for depositing diamond films by dielectric barrier discharge

A method for depositing a substance, such as diamond, by plasma deposition on a substrate mounted over a madrel cooled by a heat exchange, comprising the steps of: determining the heat flux at the deposition surface of the substrate; providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux; and depositing said substance on said substrate by said plasma deposition.

Method for depositing a substance with temperature control

A method for depositing a substance, such as diamond, on a surface of a substrate with temperature control, which comprises the steps of providing a cooling block having a surface that is cooled by heat exchange; supporting said substrate from said cooling block so that the bottom surface of said substrate is spaced from said cooling block surface by a gap, the size of said gap being in the range of 0.01 cm to 0.30 cm; providing a gas in said gap; and depositing said substance on the top surface of said substrate, whereby heat, resulting from said depositing of said substance, flows by conduction across said gap from said substrate to said cooling block.

An apparatus for depositing a substance with temperature control includes, in one embodiment: a mandrel rotatable on an axis; a spacer mounted on the mandrel; a substance mounted on the spacer; a plasma, containing constituents of the substance being deposited, directed toward the substrate; the spacer having a thermal conductance in its thickness direction that varies with radial dimension.

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Foothill Ranch, CA, United States of America

Michael S Heuser