Singulus Technologies Ag

Balzers Und Leybold Deutschland Holding Ag

Singulus Technologies Gmbh

Michael Reising

Stefan Kempf

Bernhard Cord

Michael König

Oliver Hohn

Jörg Koch

Uemit Seyhan

Peter Reustle

Georg Roth

Benjamin Mandlmeier

Mathias Hohlmayer

Dieter Scherger

Johannes Grübler

Jens Eckstein

Jan-Christof Jacobi

Kurt Pietsch

ÜMit Seyhan

The present invention is directed to a method and an apparatus for providing vapor for a discontinuous process.

Process and device for providing vapor

A vacuum lock for a vacuum coating plant comprises a chamber for receiving a substrate carrier, wherein the chamber comprises a first and a second inner surface. A conveyor is configured for conveying the substrate carrier. The vacuum lock comprises a flow channel assembly for evacuating and venting the chamber, the flow channel assembly being configured to cause a gas flow between both the first inner surface and a first substrate carrier surface facing the first inner surface and between the second inner surface and a second substrate carrier surface facing the second inner surface. The substrate carrier can be positioned between the first and the second inner surfaces such that a ratio of a first distance between the first inner surface and the first substrate carrier surface to a length (L) of the substrate carrier is smaller than 0.1, and a ratio of a second distance between the second inner surface and the second substrate carrier surface to a length (L) of the substrate carrier is smaller than 0.1.

Vacuum lock and method for transferring a substrate carrier

A device for treating substrates by a treating liquid has at least one rotatably supported support roller which a substrate to be treated rests on during operation. The support roller has a hollow cylinder having a porous rigid material which the substrate to be treated rests on during operation. The device is configured to deliver, during operation, treating liquid via the interior of the hollow cylinder of the at least one support roller through the porous rigid material to the external surface of the hollow cylinder in order to treat at least one surface of the substrate by the treating liquid. The device is configured to treat several substrates in the form of plate-shaped separate wafers arranged one behind the other and/or next to one another in the device, by the treating liquid and to transport the substrates in a transport plane during the treatment.

Device and method for treating substrates using a support roller having a porous material

The invention describes a method and a device for introducing and removing substrates. Substrates () are transported into a lock () by a transport element (). A collection container () is located in the lock below the substrates () for collecting possible substrate fragments (). The substrates () are removed together with the collection container () and the lock cover () once the lock () has been flooded. The lock cover () and the collection container () form an almost closed box around the substrates (). After the substrates () have been replaced and the collection container () has been emptied, the new substrates () are introduced together with the collection container. All the steps are carried out in the machine cycle to ensure an effective production process.

Method and device for introducing and removing substrates

A device for transporting a substrate () into a working area () which can be temporarily separated in a vacuum-tight manner, and a corresponding method. A transport element () transports a substrate () in the plane (XY) to a defined working area () of a chamber (). The transport element () has a deflectable sealing frame () which can be moved in a Z-direction perpendicular with respect to the XY-plane. The sealing frame () has two opposing sealing surfaces () in the Z-direction. By pressing a closure element () against a first sealing surface () and thus pressing the second sealing surface () against a chamber wall (), the space of the working area () of the chamber () can be sealed.

Transport device having a deflectable sealing frame

A device 1 for gripping and holding substrates 2 with one or several substrate holders 5 arranged in a vacuum chamber 4, 4', 4' and one or several displaceably arranged grippers 3, which can be displaced into a first position through the action of an operating pressure or against the action of a spring 6, and into a second position through the action of a diaphragm 7, which can be exposed to a pneumatic pressure P.sub.a and/or to an operating element 8 cooperating with it, wherein the substrate 2 is held when the diaphragm is in a first position and the substrate 2 is released for being further transported when the diaphragm is in a second position. The diaphragm 7 is integrated into the vacuum chamber in such a way that in an operating position it is exposed to atmospheric pressure P.sub.a on the one side 9 and on the other side 10 to vacuum pressure P.sub.v, and in a second position is exposed to vacuum pressure P.sub.v on both sides.

Device for gripping and holding substrates

Several finger-like grippers (4) are held and guided in openings or holes (21) in the head part (6) of a housing (20) so they can pivot about axes which are in a common plane transverse to the longitudinal axis (L) of the housing (20). Permanent magnets (11, 12) fixed to the inner ends of the grippers (4) cooperate with an electromagnet (13) provided in the housing (20) above the magnets (11, 12), the magnetic field axis of the electromagnet coinciding with the longitudinal axis (L) of the housing (20). The electromagnet moves the inner ends of the grippers (11, 12) back and forth between two stops (16, 17) depending on the polarity of the electromagnet (13).

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Mömbris, Germany

Michael Reising