Texas Instruments Corporation

Michael P Keleher

Jeffrey A McKee

Troy H Herndon

Jing-Shing Shu

A mask ( ) includes a pattern ( ) having a plurality of substantially rectangular shapes ( ) arranged longitudinally in each of a plurality of substantially parallel rows ( ). The rows ( ) are evenly spaced apart from each other. The substantially rectangular shapes ( ) in each row ( ) are evenly spaced apart from each other and offset from the substantially rectangular shapes ( ) in neighboring rows ( ). The substantially rectangular shapes ( ) define a plurality of T-shapes ( ) connected to and offset from each other.

Mask and method for forming dynamic random access memory (DRAM) contacts

A mask (,) includes a pattern (,) having a plurality of substantially rectangular shapes (,) arranged longitudinally in each of a plurality of substantially parallel rows (,). The rows (,) are evenly spaced apart from each other. The substantially rectangular shapes (,) in each row (,) are evenly spaced apart from each other and offset from the substantially rectangular shapes (,) in neighboring rows (,). The substantially rectangular shapes (,) define a plurality of T-shapes (,) connected to and offset from each other.

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Lockport, NY, United States of America

Michael P Keleher