Symyx Technologies, Inc.

Komag Corporation

Lam Research Ag

Symyx Solutions, Inc.

Freeslate, Inc.

Michael Myslovaty

Gary Michael Diamond

Howard W Turner

Eric L Dias

James A W Shoemaker

Keith Hall

Vince J Murphy

Shenheng Guan

Ravi Srinivasan

H Sam Bergh

Daniel Meron Pinkas

Mikhail Spitkovsky

James R Engstrom

Thomas Harding McWaid

Robbie Singh Sidhu

Thorsten B Lill

Andreas Fischer

Richard Howard Gould

Harald F Okorn-Schmidt

Ronald Allen

Philipp Engesser

Michael Spitkovsky

Michael Edwin Slafter

Anders Joel Bjork

Mikhail Spitkovsy

An apparatus for processing wafer-shaped articles comprises a vacuum transfer module and an atmospheric transfer module. A first airlock interconnects the vacuum transfer module and the atmospheric transfer module. An atmospheric process module is connected to the atmospheric transfer module. A gas supply system is configured to supply gas separately and at different controlled flows to each of the atmospheric transfer module, the first airlock and the atmospheric process module, so as to cause: (i) a flow of gas from the first airlock to the atmospheric transfer module when the first airlock and the atmospheric transfer module are open to one another, and (ii) a flow of gas from the atmospheric transfer module to the atmospheric process module when the atmospheric transfer module and the atmospheric process module are open to one another.

Wet-dry integrated wafer processing system

Described is a parallel batch reactor for effecting chemical reactions. The parallel batch reactor includes a plurality of reactor vessels for receiving components of a reaction, an inlet port for receiving pressurized fluid, and a plurality of valves configured to transfer fluid from the inlet port to the reactor vessels and fluidically isolate one or more of the reactor vessels from at least one of the other reactor vessels. The reactor further includes a pressure monitoring system comprising an array of pressure sensors configured to sense pressure in the reactor vessels. Each of the pressure sensors is aligned with one of the plurality of reactor vessels and located external to the reactor vessels and fluid passageways in fluid communication with the reactor vessels.

Parallel batch reactor with pressure monitoring

In one embodiment, a parallel batch reactor generally includes a plurality of reactor vessels and a plurality of valves configured to allow flow into the reactor vessels when a gas is supplied to the reactor at a pressure higher than a pressure within the reactor vessels and restrict flow from the reactor vessels. A method includes inserting chemical components into the reactor vessels, supplying a first gas to the reactor vessels to pressurize the reactor vessels, stopping supply of the first gas, and supplying a second gas to the reactor at a lower pressure than a pressure within the reactor vessels. The second gas passes through the valves and into the reactor vessels when the pressure within the reactor vessels drops below the pressure of the second gas.

Methods for chemical reactions in a parallel batch reactor

Gas chromatographs of the invention generally comprise four or more analysis channels. Specifically, four or more gas chromatography columns are configured for parallel analysis of four or more gaseous samples with detection being effected using a microdetector array comprising four or more microdetectors. In one embodiment, the four or more microdetectorsare microfabricated detectors, and are integrally formed with a substrate or with one or more microchip bodies mounted on a substrate. In a preferred embodiment, a microdetector array comprises four or more thermal conductivity detectors having one or more thin-film detection filaments. A preferred heated environment for highly parallel gas chromatographs is also disclosed.

Parallel gas chromatograph with microdetector array

Gas chromatographs of the invention generally comprise four or more analysis channels. Specifically, four or more gas chromatography columns are configured for parallel analysis of four or more gaseous samples with detection being effected using a microdetector array comprising four or more microdetectors. In one embodiment, the four or more microdetectors are microfabricated detectors, and are integrally formed with a substrate or with one or more microchip bodies mounted on a substrate. In a preferred embodiment, a microdetector array comprises four or more thermal conductivity detectors having one or more thin-film detection filaments. A preferred heated environment for highly parallel gas chromatographs is also disclosed.

Apparatus for placing covers (5, 8) on a cassette (1) and taking covers (5, 8) off a cassette (1) comprises an upper cover removal structure (100U), a lower cover removal structure (100L), and means for holding the cassette in place (170-176). The upper cover removal structure (100U) includes a central body portion (102), a pair of arms (104, 106) rotatably mounted at the end of the central body portion, and fingers (112, 114) located at the end of the arms (104, 106). The fingers (112, 114) can be moved up and down in a direction parallel to the main axis of the arms. The upper cover removal structure (100U) includes means for moving the upper cover removal structure (100U) toward or away from the cassette (1). The lower cover removal structure (100L) includes a central body portion and a pair of arms 156, 158 having fingers (190, 192) at the ends thereof. The arms can move inwardly or outwardly to grasp the bottom cover (8). Also included are means (154) for moving the lower cover removal unit (100L) toward or away from the cassette. The apparatus is designed to minimize generation of particulate contamination. For example, during use, arms (104, 106) and fingers (112, 114) pull tongues (20) of top cover (5) outwardly so that catches (23) on tongues (20) do not snap over rims on the cassettes and generate particulate contamination.

Shipping cassette lid and unlid automation

Growing community of inventors

San Jose, CA, United States of America

Michael Myslovaty