Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl-zeiss-stiftung

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Carl Zelss Smt Ag

Michael Muehlbeyer

Johannes Lippert

Stefan Xalter

Hubert Holderer

Ulrich Weber

Alexander Kohl

Juergen Fischer

Wolfgang Hummel

Jochen Weber

Thomas Bischoff

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Markus Neumaier

Raoul Reiner

Stefan Schoengart

Bernhard Gellrich

Yim-Bun Patrick Kwan

Hermann Bieg

Uy-Liem Nguyen

Marcus Will

Baerbel Trossbach

Franz Sorg

Frank Melzer

Guenter Maul

Albrecht Hof

Michael Trunz

Thomas Ittner

Stephan Back

Baerbel Schwaer

Klaus Mehlkopp

Yim-Bum Patrick Kwan

Karlheinz Schuster

Reiner Raoul

The invention relates to an optical imaging device, in particular an objectivefor microlithography in the field of EUVL for producing semiconductor components, having a beam path, a plurality of optical elementsand a diaphragm devicewith an adjustable diaphragm opening shape. The diaphragm device has a diaphragm storewith a plurality of different diaphragm openingswith fixed shapes in each case, which can be introduced into the beam path

Diaphragm changing device

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

The invention relates to an apparatus for manipulation of an optical element () in up to six degrees of freedom with respect to a structure () via at least three actuator devices (). The actuator devices () each have at least two force-controlled actuators, which each produce an effective force along one degree of freedom, with linking points () of the actuator devices () acting directly on the optical element ().

Apparatus for manipulation of an optical element

An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.

Device consisting of at least one optical element

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Imaging device in a projection exposure machine

In a system for overcoming or at least damping oscillations in or through channels () which carry fluid in a component, in particular coolant in cooling channels in an optical element (), in particular a projection objective lens () for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

System for damping oscillations

An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.

Optical system with isolated measuring structure

In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

Oscillation damping system

An optical imaging device, in particular a lens system, has a system diaphragm ( ). An aperture of the system diaphragm ( ) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm ( ) with respect to the optical axis ( ) of the system diaphragm ( ) is fixed in dependence on the opening diameter (D) of the system diaphragm ( ).

Optical imaging device, in particular lens system, with at least one system diaphragm

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Aalen, Germany

Michael Muehlbeyer