Carl-zeiss-stiftung

Amsl Netherlands B.v.

Michael M&uuml;hlbeyer

Erik Roelof Loopstra

Johannes Hubertus Josephina Moors

Antonius Johannes Josephus Van Dijsseldonk

Dominicus Jacobus Petrus Adrianus Franken

Albrecht Hof

Michael Trunz

Erich Merz

Josephus Jacobus Smits

Ralf Hilgers

Klaus Mehlkopp

G&uuml;nter Maul

A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1&times;10 K .

Lithographic apparatus and device manufacturing method

An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.

Optical imaging device, particularly an objective, with at least one optical element

Growing community of inventors

Aalen, Germany

Michael Mühlbeyer

Growing community of inventors

Aalen, Germany

Michael M&uuml;hlbeyer

Michael Mühlbeyer