Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Karl Otto Braun Gmbh & Co Kg

Michael Lill

Toralf Gruner

Karl-Heinz Schuster

Bernhard Gellrich

Ulrich Loering

Christoph Zaczek

Alexandra Pazidis

Stephan Six

Markus Brotsack

Karl-Stefan Weissenrieder

Alexander Hirnet

Michael Widmann

Ruediger Duesing

Guenter Scheible, Legal Representative

Harald Schink

Andreas Schubert

Tilmann Von Papen

Thomas Ihl

Rüdiger Düsing

The invention relates to a pipeline lining material for use for at least two, preferably three, predefined pipeline nominal widths, comprising an elastic round knitted material, which is knitted under pretension so as to contract to an untensioned diameter of +/&#x2212;10% of the smallest predefined pipeline nominal width after being knitted, and comprising an elastically flexible film tube arranged around the round knitted material. The pipe lining material can be expanded by at least 50% in the transverse direction under a pressure of maximally 0.7 bar, at which the untensioned round knitted material maximally has a diameter that is reduced by 55% compared to the round knitted material under pretension.

Pipe lining material for use for at least two predefined pipeline nominal widths

An optical arrangement for immersion lithography, having at least one component () to which a hydrophobic coating () is applied, the hydrophobic coating () being exposed to UV radiation during operation of a projection lens, and the at least one component () being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating () includes at least one UV-resistant layer () that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same

In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

Projection objective for immersion lithography

Growing community of inventors

Kaiserslautern, Germany

Michael Lill