Mks Instruments, Inc.

Michael L'Bassi

Junhua Ding

Kaveh H Zarkar

Mark James Quaratiello

Tseng-Chung Lee

Wayne Cole

Gordon Hill

William R Clark

Ronald H Bouley

David D'Entremont

Devices and methods for mass flow verification are provided. A mass flow verifier includes a chamber configured to receive a fluid, a critical flow nozzle upstream of the chamber, a chamber valve, a downstream valve, and a bypass valve. The chamber valve is configured to selectively enable fluid flow from the critical flow nozzle to the chamber. The downstream valve is configured to selectively enable fluid flow from the chamber to a downstream location. The bypass valve is configured to selectively enable fluid flow from the critical flow nozzle to a dump location. The mass flow verifier further includes a controller configured to verify flow rate of the fluid based on a rate of rise in pressure of the fluid as detected by a pressure sensor in the chamber.

Method and apparatus for mass flow verification

A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.

Method and apparatus for pulse gas delivery using an external pressure trigger

In a pulse gas delivery system, a chamber is pre-charged to a prescribed pressure through an upstream valve. Thereafter, a downstream control valve is opened to control flow of the gas during a gas pulse. A dedicated controller may control the downstream control valve in a feedback loop during the pulse based on pressure and temperature detected during the pulse.

Method and apparatus for pulse gas delivery

A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the mass flow controller includes an input configured to receive an input signal; an output configured to provide an output signal; a communication port configured to receive program instructions; memory configured and arranged to receive programming data determining the programmed configuration of the mass flow controller as either a digital or analog configuration; and a processor/controller for operating the mass flow controller in accordance with the programmed configuration.

System for and method of fast pulse gas delivery

Fluid control systems, including mass flow control systems, mass flow ratio control systems, and mass flow and ratio control systems, as well as corresponding methods for fluid control are provided. These systems allow one shared pressure sensor to be used for multiple flow channels, and a controller which can accurately determine mass flow on the basis of fluid pressure detected by this shared pressure sensor.

Methods and apparatus for multiple channel mass flow and ratio control systems

A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.

Method and apparatus for pulse gas delivery with isolation valves

Methods, systems, and apparatus for pressure-based flow measurement are provided. A processor receives, from the pressure-based mass flow controller (MFC), an upstream pressure value P. The processor computes, for the pressure-based mass flow controller (MFC), a downstream pressure value Pbased on the received upstream pressure value P. The processor computes, for the pressure-based mass flow controller (MFC), a flow rate Q based on the received upstream pressure value Pand the computed downstream pressure value P. The processor controls a flow through the pressure-based mass flow controller (MFC) based on the computed flow rate Q. The methods, systems, and apparatus can be used for flow measurement in non-critical or un-choked flow conditions.

Method and apparatus for pressure-based flow measurement in non-critical flow conditions

A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process.

A mass flow verifier (MFV) that is space-efficient and can verify flow rates for unknown fluids over a wide range of flow rates includes a chamber configured to receive a fluid, a critical flow nozzle connected to the chamber, and first and second pressure sensors that, respectively, detect fluid pressure in the chamber and upstream of the critical flow nozzle. A controller of the MFV is configured to verify flow rate of the fluid by, (i) at a first flow range, measuring a first flow rate based on a rate of rise in pressure of the fluid as detected by the first pressure sensor and determining a gas property function of the fluid based on pressures as detected by the first second pressure sensors, and (ii) at a second flow range, measuring a second flow rate based on pressure detected by the second pressure sensor and the determined gas property function.

Methods and apparatus for wide range mass flow verification

A mass flow controller comprises: a pressure-based flow meter, a thermal-based flow meter, a control valve, and a system controller. The pressure-based flow meter and thermal-based flow meter each measure flow rate of mass through the mass flow controller. The control valve controls the flow rate in response to a control signal generated as a function of the flow rate as measured by thermal-based flow meter when the measured flow rate is relatively low, and as a function of the flow rate as measured by the pressure-based flow meter when the flow rate is relatively high. A comparison of the flow measurements of the two flow meters can be used to (a) sense pressure disturbances at low flow rates, and (b) sense when the thermal-based flow meter is out of calibration so that a zero offset signal can be applied to the thermal-based flow meter.

System for and method of providing pressure insensitive self verifying mass flow controller

A system for dividing a single mass flow into a plurality N of secondary flows includes an inlet configured to receive the single mass flow, a master FRC (flow ratio controller), and one or more slave FRCs. Each FRC is connected to the inlet and including at least one flow channel. The master FRC and the slave FRCs include in combination a total of N flow channels. Each flow channel i (i=1, . . . , N) is connected to carry a corresponding one of the N secondary flows. In response to preselected ratio setpoints received from a host controller, the master FRC and the slave FRCs maintain ratios Q/Q(i=1, . . . , N) between individual flow rates Q(i=1, . . . , N) and a total flow rate Qat the preselected ratio set points.

Multiple-channel flow ratio controller

An integrated pressure and flow ratio control system includes N mass flow controllers MFC(i=1, . . . , N) that each control the flow rate of a fluid F(i=1, . . . , N) flowing into a processing chamber. These N mass flow controllers are linked together by a digital communication network. One of the mass flow controllers is a master MFC, and the remaining N&#x2212;1 MFCs are slave MFCs. The master MFC receives a pressure set point and a plurality N of flow ratio set points from a host controller, and communicates these set points to all the slave MFCs. In this way, the pressure in the chamber is maintained at the pressure set point and the flow ratios Q/Qare maintained at the flow ratio set points, where Qis flow rate of the i-th fluid F, and Q=Q+Q+ . . . Qis the sum of all N flow rates.

Integrated pressure and flow ratio control system

A thermal mass flow controller for controlling flow rate of a fluid includes a conduit configured to receive the fluid, a pressure sensor that measures the pressure of the fluid as the fluid flows within the conduit, a temperature sensor that measures the ambient temperature of the fluid, and a thermal sensor that generates an output representative of the flow rate of the fluid. The thermal mass flow controller further includes a control system configured to monitor the output from the thermal sensor, the pressure measured by the pressure sensor, and the ambient temperature measured by the temperature sensor, to regulate flow of the fluid within the conduit so as to compensate for a shift in the thermal sensor output caused by thermal siphoning.

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Sterling, MA, United States of America

Michael L'Bassi