Leybold Optics Gmbh

BÜhler Alzenau Gmbh

Michael Klosch-Trageser

Harro Hagedorn

Michael Scherer

Jurgen Pistner

Jürgen Pistner

The invention relates to an apparatus () for producing a reflection-reducing layer on a surface () of a plastics substrate (). The apparatus comprises a first sputtering device () for applying a base layer () to the surface () of the plastics substrate (), a plasma source () for plasma-etching the coated substrate surface (), and a second sputtering device () for applying a protective layer () to the substrate surface (). These processing devices () are arranged jointly in a vacuum chamber (), which has inlets () for processing gases. In order to move the substrate () between the processing devices () in the interior of the vacuum chamber (), a conveying apparatus () is provided which is preferably in the form of a rotary table (). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface () of the plastics substrate ().

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Munich, Georgia

Michael Klosch-Trageser