Advanced Energy Industries, Inc.

Michael Kishinevsky

Andrew Shabalin

Colin Quinn

Michael S Amann

David J Christie

Dmitri Kovalevskii

Andrew Shablin

Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Method of providing a material processing ion beam

The invention pertains to the use of enhanced electron emitting surfaces to increase the supply of electrons in a thin film deposition system including the ion source in order to enhance the deposition rates of thin film materials. The use of enhanced electron emitting surfaces reduces the erosion of component parts in the ion source while increasing the rate and quality of the film deposited on the substrate. Allowing for ion source operation at lower gas pressure also increases the range of cold-cathode applications and improving operation at all pressures. The cathode section of the ion source is comprised of a reactive material that upon reaction with a reactive gas forms an insulating thin film on the cathode surface that provides an addition source of electrons for the ion beam source. Also, electron emitters located outside of the ion beam source have cathode sections that comprise enhanced electron emitting surfaces to provide electron flow to the ion beam.

Enhanced electron emissive surfaces for a thin film deposition system using ion sources

There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.

Power supply with flux-controlled transformer

Method for deposition of diamond like carbon

Growing community of inventors

Fort Collins, CO, United States of America

Michael Kishinevsky