Asml Netherlands B.v.

Michael Jozef Mathijs Renkens

Sander Frederik Wuister

Andre Bernardus Jeunink

Gerard Van Schothorst

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Catharinus De Schiffart

Gregor Edward Van Baars

Erik Roelof Loopstra

Toon Hardeman

Norbert Erwin Therenzo Jansen

George Arie Jan De Fockert

Han-Kwang Nienhuys

Adrianus Hendrik Koevoets

Marc Wilhelmus Maria Van Der Wijst

Jeroen Dekkers

Christiaan Alexander Hoogendam

Vadim Yevgenyevich Banine

Hans Butler

Engelbertus Antonius Fransiscus Van Der Pasch

Hendricus Johannes Maria Meijer

Andrey Alexandrovich Nikipelov

Gosse Charles De Vries

Robertus Leonardus Tousain

Maurice Willem Jozef Etiënne Wijckmans

Martinus Agnes Willem Cuijpers

Carolus Johannes Catharina Schoormans

Robertus Johannes Marinus De Jongh

Leonardus Adrianus Gerardus Grimminck

Ronald Petrus Hendricus Faassen

Arie Jeffrey Den Boef

Sjoerd Nicolaas Lambertus Donders

Martinus Hendrikus Antonius Leenders

Pieter Willem Herman De Jager

Franciscus Johannes Joseph Janssen

Ramon Pascal Van Gorkom

Jozef Petrus Henricus Benschop

Olav Waldemar Vladimir Frijns

Felix Godfried Peter Peeters

Borgert Kruizinga

Theo Anjes Maria Ruijl

Alexander Matthijs Struycken

Johannes Antonius Gerardus Akkermans

Wouter Joep Engelen

Rilpho Ludovicus Donker

Pertrus Rutgerus Bartray

Andelko Katalenic

Petrus Rutgerus Bartraij

Peter Hoekstra

Johan Juliana Dries

Lucas Johannes Peter Ament

Adrian Toma

Dominicus Jacobus Petrus A Franken

Ruben Jan Kok

Martinus Cornells Maria Verhagen

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Imprint lithography

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Imprint lithography apparatus and method

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Beam delivery apparatus and method

A reflector () comprising a plate () supported by a substrate (), wherein the plate has a reflective surface () and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array () is provided in the reflector. The channels () of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

Reflector

An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

Radiation beam apparatus

An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.

Undulator

A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

Method for calibration of an encoder scale and a lithographic apparatus

In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.

Lithography method and apparatus

A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

Measurement of the position of a radiation beam spot in lithography

A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

Positioning system, lithographic apparatus and device manufacturing method

Growing community of inventors

Sittard, Netherlands

Michael Jozef Mathijs Renkens