Lam Research Corporation

Michael John Selep

Sean M Donnelly

Timothy Scott Thomas

Karl Frederick Leeser

Patrick G Breiling

David William Kamp

Bin Luo

Matthew B Schick

Showerheads for semiconductor processing equipment are disclosed that include various features designed to promote thermal control of the showerhead in high-temperature applications.

Thermally controlled chandelier showerhead

A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Growing community of inventors

Portland, OR, United States of America

Michael John Selep