Asml Netherlands B.v.

Michael Johannes Vervoordeldonk

Mark Constant Johannes Baggen

Hans Butler

Joeri Lof

Jan-Gerard Cornelis Van Der Toorn

Jan Van Eijk

Maurice Willem Jozef Etiënne Wijckmans

Johannes Hubertus Antonius Van De Rijdt

Marcel Koenraad Marie Baggen

Jeroen Pieter Starreveld

Youssef Karel Maria De Vos

Michel Gerardus Pardoel

Stefan Geerte Kruijswijk

Ronald Casper Kunst

Robertus Jacobus Theodorus Van Kempen

Antoine Hendrik Verweij

Jacobus Frederik Molenaar

Gerbrand Petrus Johannes Van Den Hoven

Gerardus Johannes Verdoes

Youssef De Vos

A lithographic apparatus is described, the apparatus comprising:

Lithographic apparatus and device manufacturing method

A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

Substrate handling system and lithographic apparatus

A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Lithographic apparatus and stage system

A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.

A position control system configured to control the position of a movable object, includes: a position measurement system configured to determine a position of a sensor or sensor target on the movable object, a comparator configured to provide an error signal by comparing a set-point position and a position feed-back signal based on the measured position, a controller to provide a control signal based on the error signal, a feed-forward device to provide a feed-forward signal on the basis of a first signal related to the desired position, and one or more actuators configured to act on the movable object based on the control signal and the feed-forward signal, wherein the position control system further includes a compliance compensation device providing a compliance compensation signal, wherein the compliance compensation signal is subtracted from a measured position of the position measurement system to obtain the feed-back position signal.

Position control system, a lithographic apparatus and a method for controlling a position of a movable object

A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.

Masking device, lithographic apparatus, and device manufacturing method

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Rosmalen, Netherlands

Michael Johannes Vervoordeldonk