3m Innovative Properties Company

Michael J Parent

William M Lamanna

Patricia M Savu

Lawrence A Zazzera

Richard M Flynn

Frederick E Behr

Zhongxing Zhang

Paul E Rajtar

Michael G Costello

Susrut Kesari

Zai-Ming Qiu

George G I Moore

Daniel R Vitcak

Richard M Minday

Fred E Behr

Lawrence A Zazerra

Klaus Hintzer

David B Olson

John G Owens

Kai Helmut Lochhaas

Billy Lee Weaver

Michael J Bulinski

Denis Duchesne

Haiyan Zhang

Sean M Smith

Silva K Theiss

Jason M Kehren

Steven D Boyd

Harry E Johnson

Paul E Rivers

Described herein is a polymer comprising: interpolymerized units of (i) a fluorinated terminal alkene monomer and (ii) a tertiary amine-containing fluorinated monomer comprising at least one of a vinyl amine, a substituted vinyl amine, an allyl amine, a substituted allyl amine, and combinations thereof; wherein the polymer can be amorphous or semi-crystalline with a melting point no greater than 325&#xb0; C. Dispersions thereof and methods of making and using the same are also described.

Amine-containing polymers, dispersions thereof and methods of making and using the same

Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

Fluorinated sulfonamide surfactants for aqueous cleaning solutions

A coatable composition that comprises water, a film-forming organic polymer, and a leveling agent comprising an anionic species represented by the formula wherein Rrepresents a perfluoroalkyl group having from 4 to 6 carbon atoms, and R represents H or an alkyl group having from 1 to 18 carbon atoms.

Coatable composition

The present invention is directed to certain fluorinated surfactants, and use thereof in acid etch solutions, such as in aqueous buffered acid etch solutions. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.

Fluorinated surfactants for buffered acid etch solutions

The present invention provides plating solutions having either copper bis(perfluoroalkanesulfonyl) imides or copper tris(perfluoroalkanesulfonyl) methides and methods of electrochemically or chemically depositing copper interconnects using these plating solutions.

Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor

Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.

Fluorinated surfactants for aqueous acid etch solutions

The present invention provides for the use of bis(perfluoroalkanesulfonyl)imide and its salts as surfactants or additives applications having an extreme environment.

Bis(perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor

Dyed fluoropolymers that are useful, for example, as conformal coatings comprise the reaction product of one or more fluorochemical (meth)acrylate monomers and one or more (meth)acrylate functional dyes. Coating compositions comprise the dyed fluoropolymer and articles are coated with the coating composition.

Dyed fluoropolymers

The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions.

Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor

The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.

Fire extinguishing compositions and methods for extinguishing, controlling, or preventing fires are described wherein the extinguishing agent is a fluorinated ketone having up to two hydrogen atoms, alone, or in admixture with a co-extinguishing agent selected from hydrofluorocarbons, hydrochlorofluorocarbons, perfluorocarbons, perfluoropolyethers, hydrofluoroethers, hydrofluoropolyethers, chlorofluorocarbons, bromofluorocarbons, bromochlorofluorocarbons, iodofluorocarbons, hydrobromofluorocarbons, and mixtures thereof.

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Oakdale, MN, United States of America

Michael J Parent