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Dr&auml;gerwerk Aktiengesellschaft

Michael Hackenberg

Matthias Studer

A process and device measures and checks concentration values of a plurality of gas components in a gas sample. The distortion of the measuring results by temperature and moisture effects, contamination as well as cross sensitivity and drift phenomena of the sensors of the gas-measuring device is a frequent problem in the measurement of gases by a gas-measuring device. It is possible with the process to recognize implausible measuring results as such on the gas-measuring device without design measures. This is achieved by the evaluation of data of suitably selected calibrating gases, from which a subvector space is constructed in the vector space of all possible measurement data (s , s , s ), represented as a plane (E), and a corresponding tolerance range is constructed. If the data (*) determined later during a measurement, are in the tolerance range, they are classified as plausible, and otherwise as implausible. The subvector space is constructed, e.g., such that the sum of the distances of the measurement points belonging to the calibrating gases from the subvector space is as small as possible.

Process and device for measuring the concentrations of a plurality of gas components in a gas sample

A system for measuring the concentration of gases using gas-selective indicator substances in a chip-like carrier (,) with an optoelectronic scanning device (,). The chip-like carrier (,) has composite partial elements (,) wherein one partial element (,) contains channels (,) for guiding the gas in the carrier (,), and another partial element (,) has at least one multireflection element (,) for guiding light. Each multireflection element (,) is provided with a layer (,) with indicator substances, which layer faces the gases to be measured and reacts with same in a gas-selective manner. The optoelectronic scanning device (,) has at least one radiation source (,) with an associated radiation detector (,), which are in optical functional connection with each multireflection element (,).

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Lübeck, Germany

Michael Hackenberg