Inpria Corporation

Hewlett-Packard Development Company, L.p.

Tokyo Electron Limited

Michael Greer

Peter De Schepper

Douglas A Keszler

Stephen T Meyers

Alan J Telecky

Jason K Stowers

Michael K Kocsis

Shu-Hao L Chang

Kirsten Louthan

William James Allen

David C Collins

Arthur Piehl

Timothy F Myers

Sonia Castellanos Ortega

The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Process environment for inorganic resist patterning

A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.

Patterned organometallic photoresists and methods of patterning

A display system includes a light source, a spatial light homogenizer, and imaging optics. The spatial light modulator has a plurality of modulator pixels. The display system also includes a pixelated plate illuminated by the light source. The pixelated plate has a plurality of individually defined pixels formed thereon. The spatial light modulator is in optical communication with the pixelated color management device by the imaging optics and each of the modulator pixels is associated with at least one of the individually defined pixels of the pixelated plate.

Pixelated color management display

A method and apparatus includes receiving light at an intensity modulator. Subsequently, the light is received at an intensity-color modulator that includes at least one Fabry-Perot filter having a tunable optical property.

Display device

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Corvallis, OR, United States of America

Michael Greer