Huettinger Elektronik Gmbh & Co. Kg

Trumpf Huettinger Gmbh + Co. Kg

Hüttinger Elektronik Gmbh & Co. Kg

Michael Glueck

Thomas Kirchmeier

Hans-Juergen Windisch

Hanns-Joachim Knaus

Erich Pivit

Gerd Hintz

Christian Bock

Peter Wiedemuth

Markus Winterhalter

Ekkehard Mann

Moritz Nitschke

Daniel Krausse

Markus Bannwarth

Christian Fritsch

Martin Steuber

Christian Thome

Rolf Merte

Ulrich Heller

Alex Miller

Krishna Kishore Nedunuri

A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Method for producing an arc detection signal and arc detection arrangement

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Plasma supply device

Operation of a plasma supply device having at least one switching bridge with at least two switching elements, and configured to deliver a high frequency output signal having a power of &#x3e;500 W and a substantially constant fundamental frequency &#x3e;3 MHz to a plasma load is accomplished by determining at least one operating parameter, at least one environmental parameter of at least one switching element and/or a switching bridge parameter, determining individual drive signals for the switching elements taking into account the at least one operating parameter, the at least one environmental parameter and/or the switching bridge parameter, and individually driving the switching elements with a respective drive signal.

Driving switches of a plasma load power supply

In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented.

Managing a temperature of a semiconductor switching element

In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver &#x3e;500 W at a substantially constant fundamental frequency &#x3e;3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range.

Protecting high-frequency amplifers

A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Radio frequency power supply

A high frequency power supply, in particular a plasma supply device, for generating an output power greater than 1 kW at a basic frequency of at least 3 MHz with at least one switch bridge, which has two series connected switching elements, wherein one of the switching elements is connected to a reference potential varying in operation, and is activated by a driver, and wherein the driver has a differential input with two signal inputs and is connected to the reference potential varying in operation.

Isolating a control signal source in a high frequency power supply

An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network.

RF power supply

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.

An amplifier arrangement for operation at supply voltages of at least 100V and at output powers of at least 1 kW includes a half-bridge formed from two switching elements connected in series, two supply voltage terminals, and an output connection between the switching elements. A bypass capacitor is in parallel with the switching elements, and a current path is through the switching elements and the bypass capacitor, where the current path has a length of 10 cm or less, the half-bridge and the bypass capacitor are arranged on an area of 30 cm2, and a resonant circuit formed by capacitances and inductances in the current path has a resonance frequency of 100 MHz or greater.

Class D amplifier arrangement

For exciting a gas laser arrangement with a plurality of HF signals, at least two pulsed HF signals are generated arid at least two electrodes or pairs of electrodes of the gas laser arrangement are supplied with the pulsed HF signals, respectively. At least two of the electrodes or pairs of electrodes are supplied with pulsed HF signals that are phase-shifted with respect to each other.

Method and arrangement for the excitation of a gas laser arrangement

A system for controlling a power supplied to a load from a radio frequency amplifier system includes a radio frequency signal generator adapted for generating a radio frequency signal, an amplifier to which the radio frequency signal is supplied and that amplifies the radio frequency signal into a radio frequency power signal, a power coupler connected to the amplifying member for coupling the radio frequency power signals, where the power coupler includes a summing connection adapted for connection to the load and a compensating connection adapted for connection to a dissipative element. A first control value generating member is adapted for receiving a signal proportional to a power output from the power coupler at the summing connection and is adapted for generating a first control signal for controlling the amplifier or a current supply that supplies current to the amplifier. A second control value generating member is adapted for receiving a signal proportional to a power output from the power coupler at the compensating connection and is adapted for generating a second control signal for controlling the amplifier or the current supply.

Method and control system for controlling the output power of an RF amplifier system

A method of controlling an input voltage of a high frequency amplifier includes measuring power supplied to a load, determining a first control variable for a series element disposed upstream from the high frequency amplifier based on the measured power and a given set point, and determining a second control variable for a switched DC supply unit from a voltage drop across the series element such that the voltage drop does not exceed a given maximum value and does not fall below a given minimum value.

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Freiburg, Germany

Michael Glueck