Lam Research Corporation

Michael Giarratano

John Edward Daugherty

Maolin Long

Felix Leib Kozakevich

Seyed Jafar Jafarian-Tehrani

Thomas W Anderson

David R Pirkle

Fred Egley

C Robert Koemtzopoulos

Ralph Lu

A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.

Radio frequency (RF) power filters and plasma processing systems including RF power filters

Ionizable gas supplied to an electron cyclotron resonance vacuum plasma processor chamber for semiconductor wafers is excited to a plasma state by microwave energy coupled to the chamber. The level of microwave power reflected from the chamber controls the level of microwave power derived from a source driving the ionizable gas in the chamber.

Microwave plasma processor

Growing community of inventors

Union City, CA, United States of America

Michael Giarratano