Leybold Aktiengesellschaft

Leybold-heraeus Gmbh

Applied Materials Gmbh & Co Kg

Leybold Aktiengesllschaft

Michael Geisler

Michael Jung

Jorg Kieser

Rudolf Koetter-Faulhaber

Anton Zmelty

Rolf Wilhelm

Gerd Kleideiter

Bernhard Kessler

Eberhard Rauchle

Michael Scherer

Rudolf Latz

Reiner Kukla

Rainer Ludwig

Manfred Stephan Ruske

Siegfried Beisswenger

Alfons Hausler

Michael Sellschopp

Werner Katzschner

Stefan Eichholz

Rudolf K Faulhaber

Barbara Beichler

Stefan Reineck

Armin Reus

Susanne Wuerz

The invention relates to a coating for temperable substrates, in particular of glass panes. This coating comprises for example directly on the substrate an SiNlayer, thereon a CrN layer, thereon a TiOlayer and lastly an SiNlayer.

Glass coating

The invention relates to a glass coating and a method for the production of this glass coating. The glass coating comprises a first layer of ZnO and a second layer of Ag disposed thereon. Before the Ag layer is applied onto the ZnO layer, the latter is irradiated with ions.

The invention concerns an apparatus for the plasma treatment of substrates in a plasma discharge excited by a high frequency between two electrodes 3, 8 to which power is supplied by a high frequency source, where the first electrode is configured as a hollow electrode 3 and the second one as an electrode 8 holding a substrate 7 and situated upstream of the hollow chamber 10 of the first electrode which it also passes. The hollow electrode is enclosed by a dark space shield and has an edge pointing in direction of the second electrode and also has projection located between the edge. These projections are on the same potential as the second electrode. The radio frequency power is thus decoupled from the substrate bias voltage (selfbias) and the distance between the first and the second electrode can be changed.

Apparatus for plasma treatment

An apparatus and a method for producing layers on the surfaces of workpieces, preferably on spotlight, or headlight, reflector inserts formed of plastic, includes an apparatus having a vacuum chamber that can be operated as a batch system with a PCVD coating process, where a microwave ECR plasma coating source is used, and the workpieces to be coated are secured to a rotary cage arranged in the vacuum chamber. The rotary cage can be conducted past a microwave coating source with a frequency-matched and phase-matched planetary motion. Such a coating process can be used in a vacuum chamber, under plasma, and at pressures below 2.times.10.sup.-2 mbar.

Apparatus for coating substrates using a microwave ECR plasma source

Apparatus for the production of glow discharge, preferably for a large-area plasma CVD process, including a vacuum coating chamber (K) and a microwave waveguide resonator with one or more coupling points, wherein the resonator is made in the form of a microwave waveguide ring resonator (13, 13'), reaction zones (R) are formed at the coupling points between the microwave waveguide ring resonator (13, 13') and the vacuum chamber (K), and in each case a series of magnets (5, 5', . . . ; 6, 6', . . . ) of different polarity are provided, so that in front of the reaction zone (R) individual tunnels of magnetic field lines (16, 16') running parallel thereto are formed and each magnetic field (16, 16') encloses a spatially uniform plasma tube (17) in the reaction zone (R).

Apparatus for the production of glow discharge

A process gas atmosphere consisting essentially of (a) organosiloxanes and inert gas, or (b) pure silane or (c) silane plus inert gas is introduced into a vacuum chamber and exposed to microwaves to produce an electro-cyclotron resonance in a plasma for coating substrates. The process is useful for producing an adherent coating on a plastic substrate, especially an intermediate coating for a reflective coating in an automotive headlamp.

Method for producing a reflective surface on a substrate

The invention relates to a device for coupling microwave power out of a first chamber (21) into a second chamber (22). For this purpose a primary antenna (2) and a secondary antenna (3) are provided, the primary antenna (2) reaching into the first chamber (21), while the secondary antenna (3) reaches into the second chamber (22). Between the first chamber (21) and the second chamber (22) there is provided a dividing wall (20) through which a current-carrying means (11) is brought, which joins together the primary antenna (2) and the secondary antenna (3).

Apparatus for coupling microwave power out of a first space into a

Device for mounting thin, preferably flat substrates (11, 11', . . . ) and for the transport of these substrates (11, 11'. . . ) in treatment apparatus, for example vacuum coating and etching apparatus, the device being formed by a frame (1), preferably in a rectangular shape, which is of such size that in the area surrounded by the frame (1) a support, e.g., a support formed of spoke-like round rods (6, 6', . . . ). can be inserted, and on this support fastening means for mounting the substrates (11, 11', . . . ) are provided, which hold the substrates (11, 11', . . . ) such that their substantially planar lateral surfaces run approximately parallel to the plane of the frame.

Device for mounting and transporting substrates in vacuum apparatus

The invention relates to an apparatus for the production of a regular microwave field over a comparatively great area. This apparatus has a cavity resonator into which microwaves are put. Electromagnetic energy is coupled by special couplers, inductively or capacitively, out of the standing waves forming in the cavity resonator into a chamber in which preferably a plasma is contained.

Apparatus for the production of a regular microwave field

An optical recording medium for an audio-video or ROM compact disc comprises a pitted translucent base material and a layer of a corrosion resistant metal or combination of metals from the group consisting of tantalum, chromium, cobalt, and nickel. For example, TaNi or CrCo can be applied to the surface, providing good adhesion, reflecting light, providing a printable surface, and not requiring any further coating such as a protective lacquer.

Optical recording medium

The invention relates to an apparatus for the plasma treatment of substrates in a plasma discharge excited by radiofrequency between two electrodes 3, 8, supplied by a radiofrequency source, of which the first is configured as a hollow electrode 3 and the second an electrode 8 bearing a substrate 7 is placed in front of the cavity (10) of the first electrode and can be moved past the latter, the hollow electrode being surrounded by a dark-space shielding (14) and has a margin 9 pointing toward the second electrode 8 and projections 12 lying between the margins at the same potential as the first electrode 3. Between the projections 12 permanent magnets 34 are provided by which the substrate bias (self-bias) is adjustable independently of the discharge geometry, the discharge pressure and the radiofrequency power.

Apparatus for the plasma treatment of substrates

The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.

Arrangement for the production of a plasma

The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

Process for depositing silicon oxide on a substrate

The invention relates to a microwave cathode sputtering arrangement in which a cathode is disposed opposite a substrate. In the immediate vicinity of the substrate is located at least one magnetic field whose strength leads to an electron cyclotron resonance.

Microwave cathode sputtering arrangement

The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).

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Wachtersbach, Germany

Michael Geisler