E.i. Dupont De Nemours and Company

Other

Commonwealth Scientific and Industrial Research Organisation

Michael Fryd

Frank L Schadt, Iii

Ezio Rizzardo

Graeme Moad

San Hoa Thang

Charles T Berge

Christopher Scopazzi

Jeffrey W Johnson

Mookkan Periyasamy

Ernst Leberzammer

Norman Herron

Viacheslav Alexandrovich Petrov

Andrew Edward Feiring

Nora Sabina Radu

William Brown Farnham

Vladimir Grushin

Karyn B Visscher

Joe Douglas Druliner

David C Chang

Terry Roland Suess

Helmut H Frohlich

Achim R Krueger

Peter L Huesmann

S Andries Sebastian

Burt T Merriman, Jr

Richard D Redfearn

Walter E Pye

Sheau-Hwa Ma

James R Sounik

Jozef Theresia Huybrechts

Roxy N Fan

Fredrick Claus Zumsteg, Jr

Josef Huybrechts

David L Goff

Michael Karl Crawford

Bernard Feinberg

Kenneth S Kirshenbaum

Catherine Louise Moad

Hoang Vi Tran

David W Swatton

Allan Harold Olson

Paul P Bruylants

Kerstin Stranimaier

Bradford B Wayland

Julia Krstina

Laurie E Lynch

I Cheng Chu

Shakti L Mukerjee

George Poszmik

Periyasamy Mookkan

David Ck Chang

Frank Leonard Iii Schadt

The present invention relates to novel photoresist compositions and processes for preparing the same utilizing polymers having a low polydispersity via the use of certain chain transfer agents (CTA) with certain monomers to provide said polymers. The polymers incorporating the chain transfer agents can be homopolymers, or made with additional monomers to provide copolymers. These polymers/copolymers are then converted into photoresist compositions for use as such.

Photoresist compositions and processes for preparing the same

This invention provides a method for removing certain sulfur-containing groups from polymers, especially those made via RAFT polymerization processes.

Method for removing sulfur-containing end groups

The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography

The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers

The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Low-polydispersity photoimageable polymers and photoresists and processes for microlithography

Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

Photoresists and processes for microlithography

The present invention is generally directed to a polymeric metal complex comprising a polymeric material having a plurality of a first-type functional groups, wherein at least a portion of the functional groups are coordinated to at least one metal containing complex, polymeric-metal complex salts comprising at least one polymeric material having a plurality of first-type functional groups having a charge, and at least one metal complex having an opposite charge. It further relates to devices that are made with the polymeric metal complex or the polymeric-metal complex salt.

Polymers having attached luminescent metal complexes and devices made with such polymers

Nitrile/vinyl ether-containing polymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These photoresist compositions comprise 1) at least one ethylenically unsaturated compound comprised of a vinyl ether and 2) a nitrile-containing compound, e.g., acrylonitrile, which together impart high ultraviolet (UV) transparency and developability in basic media. In some embodiments, these photoresist compositions further comprise a fluoroalcohol group. The photoresist compositions of this invention have, high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which property makes them useful for lithography at these short wavelengths.

Polymers for photoresist compositions for microlithography

Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched copolymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

Microgels and process for their preparation

The present invention is directed to a process for forming star shaped microgels which include a core of crosslinked polymer and multiplicity of substantially linear polymeric arms of macromonomers attached to the core. The process includes polymerizing monoethylenically unsaturated monomers in the presence of a chain transfer agent to form macromonomers each having a terminal polymerizable ethylenically unsaturated group and then polymerizing, in presence of the macromonomers, the monoethylenically unsaturated monomers and multi-olefinic crosslinking monomers. The microgels of the present invention can be used as rheology control agents in waterborne and solvent-borne coatings and in adhesives and cosmetics.

Process for preparing star shaped microgels from macromonomers with terminal ethylenic unsaturation

This invention provides for an aqueous metallic flake containing coating composition having improved glamour. The coating composition includes a neutralized phosphated segmented copolymer dispersed in an aqueous carrier. The phosphorous moiety in the segmented copolymer passivates the metallic flakes, such as aluminum flakes, used to produce the glamour. As a result, generation of hydrogen gas is substantially reduced. The segmented copolymer is provided with hydrophobic and nonionic hydrophilic segments. Applicants have discovered that by including a nonionic hydrophilic segment in the segmented copolymer, glamour of the resultant coating composition can be improved. Furthermore, by controlling the molar ratio of the hydrophobic segment to the hydrophilic segment in the segmented copolymer and the solubility parameter of the hydrophobic segment, applicants have discovered that it is possible to use either a non-passivated aluminum flake or pre-passivated aluminum flake in the coating composition while improving glamour over conventional metallic paints and still maintaining the dispersion stability of the composition. As a result, formulator has substantial leeway in selecting from a wide array of environmentally acceptable solvents, film forming binders and components, which are typically added to a coating composition for improving the coating properties. The composition is most suited for use in automotive OEM and refinish metallic paints.

Metallic flake containing coating compositions having improved glamour

Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography

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Philadelphia, PA, United States of America

Michael Fryd