Asml Netherlands B.v.

Michael Frederik Ypma

Bob Streefkerk

Hans Butler

Jan Bernard Plechelmus Van Schoot

Wilhelmus Franciscus Johannes Simons

Robertus Johannes Marinus De Jongh

Christiaan Louis Valentin

Marco Matheus Louis Steeghs

Roel Johannes Elisabeth Merry

Leon Leonardus Franciscus Merkx

Albertus Hartgers

Nikolaos Sotiropoulos

Raoul Maarten Simon Knops

A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.

Lithographic apparatus and method for illumination uniformity correction

A projection system (PS) for a lithographic apparatus comprises: an optical path (); a plurality of sensors (S-S); one or more actuators (A-A); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M-M), the plurality of optical elements comprising: a first set of at least two optical elements (M, M) and a second set of at least one optical element (M, M). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

Projection system

Growing community of inventors

Zaltbommel, Netherlands

Michael Frederik Ypma