Shipley Company LLC

International Business Machines Corporation

Michael F Cronin

James W Thackeray

Hiroshi Ito

George G Barclay

Ronald Anthony DellaGuardia

Greg Breyta

James F Cameron

Roger F Sinta

Timothy G Adams

Martha M Rajaratnam

The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.

Copolymers and photoresist compositions comprising copolymer resin

The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.

Photoimageable compositions comprising multiple arylsulfonium

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Franklin, MA, United States of America

Michael F Cronin