Northwestern University

Dana Canada Corporation

Michael E Graham

Brian Edward Cheadle

Kimberly A Gray

Richard A Hoffman

Kostas F Dockus

William D Sproul

Robert H Krueger

Semyon Vaynman

Melville Paul Ulmer

Stefanija Kisielius, Legal Representative

Le Chen

Margaret Anna Hoffman

Margaret Anna Hoffman, Legal Representative

A mixed anatase-rutile phase, non-stoichiometric titania photocatalyst material is a highly reactive and is a UV and visible light responsive photocastalyst in the as-deposited condition (i.e. without the need for a subsequent thermal treatment). The mixed phase, non-stoichiometric titania thin film material is non-stoichiometric in terms of its oxygen content such that the thin film material shows a marked red-shift in photoresponse.

Non-stoichiometric mixed-phase titania photocatalyst

An optics element, such as an optical, IR, or X-ray mirror or mirror segment, is made by a combination of replication and lamination by depositing a first metallic layer on a replicating surface of a master or mandrel, depositing a light weight backing layer that adheres on the first metallic layer, and depositing a cover layer that adheres on the backing layer whereby the optics element comprises an in-situ deposited composite lamination of the first metallic layer, the backing layer, and the cover layer.

Method of making optics element

A brazing product for fluxless brazing comprises a substrate and a filler metal-forming composition applied to the substrate. The substrate preferably comprises aluminum, an aluminum alloy or another metal and may include at least one layer of a ceramic, carbide or nitride. The filler metal-forming composition comprises a liquid-forming layer comprising silicon and a braze-promoting layer comprising one or more metals selected from the group comprising nickel, cobalt, palladium and iron. The liquid-forming layer comprises one or more material layers. Where the liquid-forming layer comprises a plurality of layers, it may include at least one layer consisting essentially of silicon.

Layered products for fluxless brazing of substrates

A brazing product for fluxless brazing comprises an aluminum or aluminum alloy substrate; a layer of an aluminum eutectic-forming layer applied to the substrate, and a braze-promoting layer comprising one or more metals from the group comprising nickel, cobalt and iron is applied on the eutectic-forming layer. The eutectic-forming layer is preferably Si deposited by physical vapor deposition. The brazing product may be brazed to another aluminum shape or to a shape comprised of a dissimilar metal.

Fluxless brazing method and method for manufacturing layered material systems for fluxless brazing

A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant, direct current power to the target, sensing the voltage of the target material used in the process, simultaneously rapidly sensing the partial pressure of the reactive gas, and simultaneously biasing the substrate to activate the reactive gas or otherwise energizing the reactive gas in the vicinity of the substrate. An apparatus for practicing the invention is also disclosed.

Method for sputtering compounds on a substrate

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Evanston, IL, United States of America

Michael E Graham