Entegris, Inc.

Mykrolis Corporation

Michael E Clarke

Marc Brian Laverdiere

Robert F McLoughlin

John E Pillion

Dale A Maenke

Jill Boski

Wiley James Wilkinson

Embodiments disclosed herein provide a non-intrusive thermal (NIT) monitor for sensing temperatures useful for semiconductor manufacturing applications. In some embodiments, a NIT monitor comprises a thermopile, a fluid housing with a fluid window, and an elongated member positioned between the thermopile and the fluid window for transmitting or reflecting infrared signals corresponding to a temperature of a fluid in the fluid housing. The fluid housing may have a cross-sectional profile to enable the manipulation of the fluid flow under the fluid window, enhancing the speed and accuracy of the temperature sampling. The elongated member, which may be hollow and coated with gold, may an extended piece of the fluid housing or a part of an optics housing. In some embodiments, the NIT monitor is connected to a main conditioning circuit board via a cable for processing the temperature measurements at a remote location.

System and method for non-intrusive thermal monitor

The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.

Liquid filtration device

Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and then a fluid control valve. The system includes a pressure sensing system for determining a pressure drop across the fluid retention hood. The pressure drop across the fluid retention hood changes with the fluid flow rate. A control system receives signals indicating the pressure drop across the fluid retention hood and produces control signals for the fluid control valve. The control signals adjust the fluid flow rate through the fluid control valve to drive the flow rate to a desired rate, thereby driving the sensed pressure drop across the fluid retention hood to a desired pressure drop.

Systems and methods for fluid flow control in an immersion lithography system

A process for coating a solid surface ( ) with a conditioned liquid composition of substantially uniform thickness is provided. A liquid composition is conditioned by a) degassing either via vacuum or by sparging with a high kinematic viscosity gas; and b) substantially maintaining the viscosity of the liquid composition. The conditioned liquid may then be dispensed onto a solid surface ( ) positioned in a sub-atmospheric environment ( ) or in a helium-rich environment ( ). The solid surface ( ) is rotated so that the liquid composition forms a uniformly thick coating free from bubbles on the solid surface ( ) and thereby produces a thin film of uniform thickness.

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Chelmsford, MA, United States of America

Michael E Clarke