Lawrence Livermore National Security, LLC

University of California

Other

Michael D Feit

Tayyab Ishaq Suratwala

William Augustus Steele

Alexander M Rubenchik

Lana Louie Wong

Stephen Anthony Payne

Luiz B Da Silva

Lloyd A Hackel

Raymond John Beach

Stavros G Demos

Michael Dale Perry

Dennis L Matthews

Lawrence W Hrubesh

Joseph Neev

Brent C Stuart

Bernardino M Penetrante

Alan K Burnham

Ralph Henry Page

Raymond M Brusasco

Philip Edward Miller

Mark Kozlowski

Jeffrey Devin Bude

Ted Alfred Laurence

Michael E Glinsky

Paul J Wegner

Nan Shen

Phillip E Miller

Rebecca Dylia-Spears

Christopher W Carr

Russel B Wilcox

Daniel C Mason

Paul Geraghty

Lana L Wong

Richard P Desjardin

Rebecca J Dylla-Spears

A method for chemically stabilizing polishing slurries in aqueous suspension to prevent their agglomeration while maintaining their surface activity is disclosed. The method prevents the formation of irreversible particle agglomerates during drying and permits the subsequent re-suspension of dried particles with no impact on the particle size distribution. The stabilization method can be customized based on knowledge of the colloid surface charge at suspension pH conditions, addition of a charged species having like charge to the colloid at the suspension conditions, and control of the concentrations of the charged species and other ions in suspension.

Polishing slurry preventing agglomeration of charged colloids without loss of surface activity

A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.

Apparatus and method for deterministic control of surface figure during full aperture pad polishing

Apparatus and method for deterministic control of surface figure during full aperture polishing

A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.

Methods for globally treating silica optics to reduce optical damage

Optical breakdown by predetermined laser pulses in transparent dielectrics produces an ionized region of dense plasma confined within the bulk of the material. Such an ionized region is responsible for broadband radiation that accompanies a desired breakdown process. Spectroscopic monitoring of the accompanying light in real-time is utilized to ascertain the morphology of the radiated interaction volume. Such a method and apparatus as presented herein, provides commercial realization of rapid prototyping of optoelectronic devices, optical three-dimensional data storage devices, and waveguide writing.

Spectroscopic feedback for high density data storage and micromachining

The invention is a ribbon of an optical material with a plurality of cores that run along its length. The plurality of cores includes lasing impurity doped cores in an alternating spaced arrangement with index-modifying impurity doped cores. The ribbon comprises an index of refraction that is substantially equal to or greater than the indices of refraction of said array of lasing impurity doped cores. Index-increasing impurity doped cores promote antiguiding and leaky modes which provide more robust single &ldquo;supermode&rdquo; operation.

Antiguided fiber ribbon laser

The present invention provides a system that mitigates the growth of surface damage in an optic. Damage to the optic is minimally initiated. In an embodiment of the invention, damage sites in the optic are initiated, located, and then treated to stop the growth of the damage sites. The step of initiating damage sites in the optic includes a scan of the optic using a laser to initiate defects. The exact positions of the initiated sites are identified. A mitigation process is performed that locally or globally removes the cause of subsequent growth of the damaged sites.

Method for producing damage resistant optics

A method and apparatus is disclosed for fast, efficient, precise and damage-free biological tissue removal using an ultrashort pulse duration laser system operating at high pulse repetition rates. The duration of each laser pulse is on the order of about 1 fs to less than 50 ps such that energy deposition is localized in a small depth and occurs before significant hydrodynamic motion and thermal conduction, leading to collateral damage, can take place. The depth of material removed per pulse is on the order of about 1 micrometer, and the minimal thermal and mechanical effects associated with this ablation method allows for high repetition rate operation, in the region 10 to over 1000 Hertz, which, in turn, achieves high material removal rates. The input laser energy per ablated volume of tissue is small, and the energy density required to ablate material decreases with decreasing pulse width. The ablation threshold and ablation rate are only weakly dependent on tissue type and condition, allowing for maximum flexibility of use in various biological tissue removal applications. The use of a chirped-pulse amplified Titanium-doped sapphire laser is disclosed as the source in one embodiment.

Ultrashort pulse high repetition rate laser system for biological tissue

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Livermore, CA, United States of America

Michael D Feit