Mentor Graphics Corporation

Michael Christopher Lam

Konstantinos G Adam

James C Word

Ananthan Raghunathan

Germain Louis Fenger

Christopher Clifford

Sergiy Komirenko

Disclosed are techniques for processing layout designs based on dynamically-generated lithographic models. Lithographic models are determined for a plurality of regions of a reticle prior to lithographic simulation. During lithographic simulation, lithographic models for a small area within a particular region are generated based on the lithographic models for the particular region, the lithographic models for one or more neighboring regions, and location information of the small area relative to the region and to the one or more neighboring regions. The lithography models comprise illuminating and imaging system models and mask electro-magnetic field models.

Dynamic model generation for lithographic simulation

Disclosed are techniques for correcting the EUV crosstalk effects. Isolated mask feature component diffraction signals associated with individual layout feature components are determined based on a component-based mask diffraction modeling method such as a domain decomposition method. Mask feature component diffraction signals are then determined based on the isolated mask feature component diffraction signals, layout data and predetermined crosstalk signals. Here, the predetermined crosstalk signals are derived based on mask feature component diffraction signals computed using an electromagnetic field solver and the component-based mask diffraction modeling method, respectively. The mask feature component diffraction signals are then used to process layout designs.

Correcting EUV crosstalk effects for lithography simulation

Disclosed are techniques for simulating and correcting the mask shadowing effect using the domain decomposition method (DDM). According to various implementations of the invention, DDM signals for an extreme ultraviolet (EUV) lithography mask are determined for a plurality of azimuthal angles of illumination. Base on the DDM signals, one or more layout designs for making the mask may be analyzed and/or modified.

Growing community of inventors

Sunnyvale, CA, United States of America

Michael Christopher Lam