Asml Netherlands B.v.

Michaël Christiaan Van Der Wekken

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Michel Riepen

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Christian Gerardus Norbertus Hendricus Marie Cloin

Tijmen Wilfred Mathijs Gunther

Olga Vladimirovna Elisseeva

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

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Eindhoven, Netherlands

Michaël Christiaan Van Der Wekken