Etec Systems, Inc.

Michael Bohan

Timothy N Thomas

Paul C Allen

Michael Lawrence Rieger

Robin Lynn Teitzel

Matthew J Jolley

An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam is split into 32 beams to create a brush. The brush scans the workpiece through use of a rotating polygonal mirror. Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator. Signals provided to the Acousto-Optical Modulator define the pattern to be generated. These signals are created by a rasterizer. Increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.

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Beaverton, OR, United States of America

Michael Bohan