Air Products and Chemicals, Inc.

Materials Technology Corporation, Subsidiary of the Carbon/graphite

Michael B Miller

Robert D Bertin

Robert C Post

Burl M Moon

A semiconductor wafer holding and support fixture having a low effective thermal mass comprises a planar surface having a recess for a wafer and consisting essentially of chemical vapor deposited silicon carbide. The wafer holder is specifically designed to isolate the wafer from regions of significant thermal mass of the holder. The wafer holder is particularly adapted for accomplishing chemical reactions in rapid thermal processing equipment in the fabrication of electronic integrated circuits. The method for making such an article comprises shaping a substrate, e.g. graphite, to provide a planar surface having a recess installing means for masking any regions of the substrate where silicon carbide is not desired, chemically vapor depositing a conformal outer coating of silicon carbide onto the substrate, removing the means for masking and removing the graphite by machining, drilling, grit-blasting, dissolving and/or burning.

Wafer holding fixture for chemical reaction processes in rapid thermal

A brazing fixture for use in the electronics industry which resists adherence of brazing compounds and insulative materials during the brazing operation and a method for making and using the same. The fixture is characterized in that it is made from a graphite substrate coated with a composite layer of titanium carbide and titanium nitride.

Graphite brazing fixture coated with composite layers of titanium

A capillary for use in ball bonding tools designed to bond metal leads to the bonding pads on a microchip and pads or leads on a chip support is formed by chemically vapor depositing a substantially smooth silicon carbide coating having high electrical resistivity onto a substrate which is then removed by etching or combustion.

Growing community of inventors

DeSoto, TX, United States of America

Michael B Miller