Asml Netherlands B.v.

Michael Anthony Purvis

Robert Jay Rafac

Igor Vladimirovich Fomenkov

Vahan A Senekerimyan

Alexander Anthony Schafgans

Klaus Martin Hummler

Chengyuan Ding

Jie L Ding

Yezheng Tao

Andrew David LaForge

John Tom Stewart, Iv

Daniel Brown

Jason Michael Arcand

Kevin Weimin Zhang

Jordan Jur

An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.

System for monitoring a plasma

A method includes generating light in a light generating chamber, causing a portion of the generated light to pass through a tube having a roughened inner surface, and detecting the portion of the generated light that has passed through the tube using a photodetector. The roughened inner surface of the tube has a surface roughness sufficient to cause grazing incidences of light to be eliminated rather than to be reflected off the roughened inner surface. In one example, the method includes outputting a signal from the photodetector to a controller, with the signal corresponding to the detected portion of the generated light. The light generated in the light generating chamber can be extreme ultraviolet (EUV) light. In tests using roughened and non-roughened protection tubes, the roughened tube was found to minimize or essentially eliminate the contribution to EUV energy from grazing incidence reflections off the inner surface of the tube.

Method of improving measurement of energy of extreme ultraviolet radiation generated in a chamber

A light source includes a light generating chamber and a collector disposed in the light generating chamber. A target material generator configured to propel a quantity of target material toward an irradiation region is disposed in front of a reflective surface of the collector. A plurality of photodetector modules is disposed external to the light generating chamber, with each of the photodetector modules being directed toward the irradiation region. A plurality of tubes is disposed between a corresponding photodetector module and the irradiation region. Each tube has a centerline directed toward the irradiation region, and each tube has a roughened inner surface. The surface roughness of the roughened inner surface is sufficient to cause grazing incidences of light to be eliminated rather than to be reflected off the roughened inner surface. A method of generating light and a method of measuring light energy also are described.

Minimizing grazing incidence reflections for reliable EUV power measurements having a light source comprising plural tubes with centerlines disposed between a radiation region and corresponding photodetector modules

A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.

Variable radius mirror dichroic beam splitter module for extreme ultraviolet source

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Extreme ultraviolet light source

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San Diego, CA, United States of America

Michael Anthony Purvis