Asml Holding N.v.

Asml Netherlands B.v.

Michael Andrew Chieda

Raymond Wilhelmus Louis Lafarre

Tammo Uitterdijk

Adrianus Hendrik Koevoets

Michael L Nelson

Victor Antonio Perez-Falcon

Geoffrey O'Connor

Stephen Roux

Jacobus Cornelis Gerardus Van Der Sanden

Eric Justin Monkman

Jacobus Cornelius Gerardus Van Der Sanden

An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.

Reticle sub-field thermal control

A lithographic apparatus includes a clamp () configured to receive an object (). The clamp defines at least one channel () configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck () coupled to the clamp. The chuck () defines at least one void () configured to thermally insulate the chuck from the clamp.

Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus

Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.

Apparatus for and method cleaning a support inside a lithography apparatus

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Easton, CT, United States of America

Michael Andrew Chieda