Asml Netherlands B.v.

Michael Alfred Josephus Kuijken

Dennis De Graaf

Zomer Silvester Houweling

Thijs Kater

Pieter-Jan Van Zwol

Paul Janssen

Chaitanya Krishna Ande

Mahdiar Valefi

Martinus Hendrikus Antonius Leenders

Johannes Petrus Martinus Bernardus Vermeulen

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Tamara Druzhinina

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Eric Willem Felix Casimiri

Jan Hendrik Willem Kuntzel

Sicco Oosterhoff

Kevin Kornelsen

Guido Salmaso

Maxime Biron

Richard Beaudry

Stephane Martel

Mária PÉTER

A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

Pellicle for EUV lithography

A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

EUV pellicles

A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

Method for manufacturing a membrane assembly

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Son en Breugel, Netherlands

Michael Alfred Josephus Kuijken