Advanced Micro Devices Corporation

Globalfoundries Inc.

Michael Alan Retersdorf

Michael G McIntyre

Kevin R Lensing

Douglas C Kimbrough

Chandra Shekar Krishnaswamy

A method, apparatus, and a system for generating a binary mapping of wafer regions using measured value. A first measured value relating to processing a first workpiece is acquired. A second measured value relating to a second workpiece is acquired. At least a first region common to the first and second workpieces is defined. A determination is made as to whether the results associated with the first or second measured value is above a predetermined threshold. A first binary value is assigned to the first region based upon a determination that the results associated the first or second measured value data is above the threshold.

Method and apparatus for analysis of continuous data using binary parsing

A method includes determining at least a first characteristic of a device during a first test insertion and storing the first characteristic. The device is identified during a second test insertion. The first characteristic is retrieved responsive to the identification of the device. A test program for the second insertion is configured based on the first characteristic. The configured test program is executed to test the device during the second test insertion.

Method and apparatus for employing previous test insertion results for testing a device

A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correlated with the metrology data. A process control associated with a plurality of processes to be performed on a second workpiece is adjusted based upon the correlating.

Product-related feedback for process control

A method, apparatus, and a system for prioritizing processing of a workpiece is provided. At least one workpiece is processed. A tag associated with the workpiece is provided. The tag includes process priority data for determining an order relating to processing the workpiece.

Method and apparatus for automated fab control

A method for converting data includes generating a first data vector of data measurements related to processing of at least one workpiece. Each element of the first data vector is associated with at least one of a plurality of positions on the workpiece. A cumulative distribution of the elements in the first data vector is generated. An outlier region of the data measurements is identified based on the cumulative distribution. A binary outlier data vector is generated from the first data vector by assigning a first binary value to the data elements in the first data vector in the outlier region and assigning a second binary value to the remaining data elements in the first data vector.

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Austin, TX, United States of America

Michael Alan Retersdorf