Optical Coating Laboratory, Inc.

Cierra Photonics Inc.

Alluxa, Inc.

Bookham Technology Limited

Bookham (us) Inc.

Other

Cymtec, Ltd.

Michael A Scobey

Richard Ian Seddon

James W Seeser

Paul M LeFebvre

Loren F Stokes

Robert W Hallock

Lucien P Ghislain

Dennis J Derickson

Shaun Frank Mccaffery

Barry W Manley

David L Soberanis

Eric R Dickey

Bryant P Hichwa

Michael D Temple

Rad Sommer

Rance Morgan Fortenberry

Kevin J Zhang

Thomas H Allen

Craig C Van Horn

Patrick R Wentworth

Robert F Klinger

Rolf F Illsley

Brett Joseph Bryars

Thomas Larson Greenberg

Michael J Cumbo

Peter Egerton

Barrie Flintham

Richard James Ryall

Paul Johnson

Yiqiang Li

Glenn K Yamamoto

William P Kastanis

Elizabeth M Wescott

Daniel V Whitlock

R Russel Austin

Robert S Lipsky

A magnetron sputtering system includes a substrate mounted within a vacuum chamber. A plurality of cathode assemblies includes a first set of cathode assemblies and a second set of cathode assemblies, and is configured for reactive sputtering. Each cathode assembly includes a target comprising sputterable material and has an at least partially exposed planar sputtering surface. A target support is configured to support the target in the vacuum chamber and rotate the target relative to the vacuum chamber about a target axis. A magnetic field source includes a magnet array. A cathode assemblies controller assembly is operative to actuate the first set of cathode assemblies without actuating the second set of cathode assemblies, and to actuate the second set of cathode assemblies without actuating the first set of cathode assemblies.

Sputtering system with a plurality of cathode assemblies

A cathode assembly for a magnetron sputtering system includes a target comprising sputterable material having an at least partially exposed, substantially planar sputtering or erosion surface and a target support configured to support and move the target during sputtering. In certain exemplary embodiments the cathode assembly further comprises a magnetic field source, e.g., a magnet array behind the target. The target support is configured to move the sputtering surface of the target by rotating or spinning the target in the plane of the sputtering surface, moving the target linearly back-and-forth or otherwise. The target support is configured to move the target relative to the magnetic field source, which may be stationary during sputtering, e.g., relative to the cathode assembly and vacuum chamber in which the sputtering is performed. A sputtering system including such a cathode assembly also is provided. A method of sputtering is further provided, employing such a cathode assembly.

Cathode assemblies and sputtering systems

A light source assembly comprises a light pipe, a first color light source at a first tapered light collector, a second light source at a second tapered light collector, and at least a first dichroic filter operative to pass first color light and to reflect second color light toward a light output port. A light valve may be positioned to receive light from the light pipe. One or more light entrances to the light pipe may have a filter, e.g., a short wave pass filter, oriented in a plane generally parallel to the axial optical pathway.

Light source assemblies

An optical component for gain-flattening multiplexed passband signals amplified with optical pump power, comprises a launch port optical waveguide operative to communicate multiplexed passband signals in a passband wavelength range and optical pump power in a different wavelength range; a thin film demux filter oriented to receive combined multiplexed passband signals and optical pump power from the launch port optical waveguide, and operative to pass the multiplexed passband signals and to reflect the optical pump power; a bypass port optical waveguide operative and oriented to receive and carry optical pump power reflected by the demux filter; a gain-flattening filter positioned to receive from the thin film demux filter and operative to pass the multiplexed passband signals with a desired attenuation profile for gain-flattening; and an output port optical waveguide oriented to receive and operative to carry at least multiplexed passband signals passed by the gain-flattening filter. Also disclosed are optical amplifiers comprising such GFF components. Also disclosed are optical filters comprising an optical substrate, a thin film demux filter on a first surface of the optical substrate, and a gain-flattening filter on an opposite surface of the optical substrate, wherein the demux filter is operative to pass multiplexed passband signals in a passband wavelength range and to reflect optical pump power in a different wavelength range, and the gain-flattening filter is operative to pass the multiplexed passband signals and to provide a desired attenuation profile to the multiplexed passband signals.

Optical gain flattening components, optical chips and optical amplifiers and methods employing same

A fiber optic device comprises an optical lens element having a focal length greater than 2 mm, and an optical signal source or receiver mounted at the focal plane of the optical lens element and operative to communicate optical signals with a selectively transparent interference filter through the optical lens element. Methods for the production and use of the fiber optic devices are also disclosed.

Optical devices and methods

Improved optical element wafers comprising stacked, optically coupled etalon wafers are disclosed. Each etalon wafer comprises a bulk optic wafer defining the optic cavity between selectively transparent thin film mirror coatings. The bulk optic wafer comprises an optically transparent body, such as a portion of a substrate wafer, along with a wedge correcting coating on at least one of the two surfaces of the optically transparent body and/or a thickness-adjustment layer on one or both surfaces. The bulk optic wafer is a solid, self-supporting body, optically transparent (at the wavelength or wavelengths of interest), whose thickness, i.e., the dimension between the selectively transparent surfaces, defines the cavity spacing of the bulk optic etalon wafer. Methods of making and using the optical element wafers are also disclosed.

Wafer scale production of optical elements

An optical component array allowing expansion of the occupied bandwidth on an existing optical transmission network without disrupting signal traffic. Wavelength selective filters () and optical components, such as amplifiers () are arrayed for use with a wavelength division multiplexed optical transmission system to transmit a selected portion of a transmission spectrum to an amplifier path and reflect the remainder of the spectrum. Wavelength selective filters and associated amplifiers are arranged in a cascade configuration with a bypass path (). Additional wavelength selective filters and amplifiers can be added in the bypass path without disrupting existing signal traffic, and such additions can provide for a remaining bypass path, thus allowing further expansion. This configuration provides an expandable amplifier array with a low initial cost. In a further embodiment, a center segment of the input transmission spectrum is passed through an amplifier path () and a red/blue splitter () having a transition region within the band of the center segment further splits the input spectrum into two expandable amplifier arrays paths. The two arrays allow reduced insertion loss and optimization of amplifier characteristics for multi-channel systems.

Expandable optical array

Optical filter elements and optical systems comprise optically mismatched etalons and optically mismatched stacked, optically coupled etalons that are directly optically coupled, at least one of the etalons or stacked, optically coupled etalons comprising first and second selectively transparent thin film mirror coatings on opposite surfaces of a bulk optic. The optically mismatched etalons can be configured to selectively pass single passbands. The disclosed optical systems optionally comprise other devices optically coupled to the optically mismatched etalons and optionally mismatched stacked, optically coupled etalons.

Optical filter elements and methods of making and using same

An optical component array that has essentially equal path loss for each channel routed through a switching node in a re-insertion configuration and the bypass channels. An array input carrying a plurality of optical channels is coupled to a first node input. Consistent, low transmission loss through a switching node is achieved by a single fiber-beam-fiber transition. The low transmission loss is summed with other array losses to be within 3 dB of the insertion loss of a bypass path. In a particular configuration, a routing array with three switching nodes is loss-balanced to the bypass path. In another embodiment, a multi-channel filter stub in the bypass path improves residual signal suppression when a node is switched to an add/drop configuration.

Hybrid optical add/drop multiplexing devices

An improved etalon has a bulk optic defining the optic cavity between selectively transparent thin film mirror coatings. The bulk optic comprises an optically transparent body, such as a portion of a substrate wafer, along with a wedge correcting coating on at least one of the two surfaces of the optically transparent body and/or a thickness-adjustment layer on one or both surfaces. The wedge coating establishes high precision parallelism of the selectively transparent surfaces of the etalon. The bulk optic is a solid, self-supporting body, optically transparent (at the wavelength or wavelengths of interest), whose thickness, i.e., the dimension between the selectively transparent surfaces, defines the cavity spacing of the etalon. Optical elements and optical communication systems incorporating the novel etalons are disclosed, as well as methods of producing the etalons.

Optical etalons and methods of making and using them

Vacuum coating deposition apparatus and methods employ a vacuum chamber with a superstructure to which deposition components in the vacuum chamber are mounted, such as a sputter target, substrate, etc. to provide a fixed relative position between them substantially unaffected by environmental and operating vibrations and flexure of the chamber wall. The superstructure is structurally independent of the deposition chamber wall and may be housed within the chamber or externally, extending from an external position to or through the wall of the deposition chamber. A meter of sensor, e.g., an optical monitor for measuring film thickness during deposition, continually monitors at least one parameter of the coating deposition and generates a corresponding control signal. A controller responsive to the control signal continually controls at least one process variable of the coating deposition in response to the control signal.

Apparatus and method for vacuum coating deposition

Optical elements comprise stacked, optically matched and optically coupled etalons, at least one of the optically coupled etalons comprising first and second selectively transparent thin film mirror coatings on opposite surfaces of a bulk optic. The bulk optic defines the cavity spacing of the etalon and may, for example be formed of a monolithic body of silica or other optically transparent glass diced from a glass wafer. The bulk optic may further comprise a wedge coating of progressively increasing thickness overlying the monolithic glass body and compensating for, or offsetting non-parallelism of the bulk optic. The bulk optic may further comprise a thickness-adjustment layer of substantially uniform thickness. The disclosed optical elements optionally comprise other devices optically coupled to the stacked etalons. Novel methods are disclosed for producing the stacked etalons.

Optically coupled etalons and methods of making and using same

An optical system and method are disclosed for multiplexing or de-multiplexing channels within a wavelength band. The optical signals carried on the system comprise separate channels through n, each having a unique passband and a center wavelength spaced from the center wavelength of adjacent channels by d nm. The signals are semi-multiplexed, demultiplexed, or semi-demultiplexed by an interleaver comprising optically matched and directly optically coupled etalons. Periodic spectral passbands of width less than d nm, spaced from each other a distance of zd, where z is an integer greater than or equal to 3, are substantially transmitted through the interleaver. At least one of the etalons is a bulk optic etalon and comprises first and second selectively transparent thin film mirror coatings on opposite surfaces of a bulk optic that defines the cavity spacing of that etalon.

Optical system with 1&times;N interleaver and methods of making and using same

Growing community of inventors

Santa Rosa, CA, United States of America

Michael A Scobey