Advanced Energy Systems, Inc.

Michael A Peacock

Edwin Gerard Haas

Robert M Gutowski

An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly ( ) may comprise a nozzle mounting system ( ) coupled to a housing assembly ( ) to secure a nozzle ( ). A diffuser mounting system ( ) may be coupled to the housing assembly ( ) to secure a diffuser ( ). An alignment system ( ) may operate to align the nozzle ( ) and the diffuser ( ) in a spatial relationship with each other to optimize operation of the diffuser ( ) in relation to the nozzle ( ).

Holder assembly system and method in an emitted energy system for photolithography

An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (,) may comprise a nozzle mounting system (,) coupled to a housing assembly (,) to secure a nozzle (,). A diffuser mounting system (,) may be coupled to the housing assembly (,) to secure a diffuser (,). An alignment system (,) may operate to align the nozzle (,) and the diffuser (,) in a spatial relationship with each other to optimize operation of the diffuser (,) in relation to the nozzle (,).

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Bay Shore, NY, United States of America

Michael A Peacock