Intel Corporation

Other

Michael A Childs

Kevin Fischer

Ruth Amy Brain

Sanjay S Natarajan

A method including forming a dielectric layer on a contact point of an integrated circuit structure; forming a hardmask including a dielectric material on a surface of the dielectric layer; and forming at least one via in the dielectric layer to the contact point using the hardmask as a pattern. An apparatus including a circuit substrate including at least one active layer including a contact point; a dielectric layer on the at least one active layer; a hardmask including a dielectric material having a least one opening therein for an interconnect material; and an interconnect material in the at least one opening of the hardmask and through the dielectric layer to the contact point.

AVD hardmask for damascene patterning

An on-chip capacitor a semiconductive substrate is fabricated in a passivation layer that is above the back-end metallization. At least three electrodes are configured in the on-chip capacitor and power and ground vias couple at least two of the at least three electrodes. The first via has a first-coupled configuration to at least one of the first- second- and third electrodes and the second via has a second-coupled configuration to at least one of the first- second- and third electrodes.

On-chip capacitors and methods of assembling same

A method including forming a dielectric layer on a contact point of an integrated circuit structure; forming a hardmask including a dielectric material on a surface of the dielectric layer; and forming at least one via in the dielectric layer to the contact point using the hardmask as a pattern. An apparatus including a circuit substrate including at least one active layer including a contact point; a dielectric layer on the at least one active layer; a hardmask including a dielectric material having at least one opening therein for an interconnect material; and an interconnect material in the at least one opening of the hardmask and through the dielectric layer to the contact point.

A self-cooling beverage container system. The system includes a can, and an external chamber coupled to the bottom of the can for containing compressed gas therein. Helical tubing in the form of a single or double helix resides within the can. A first open end of the tubing is disposed in communication with the external chamber, and an opposing terminal end of the tubing is closed, preferably being accessible with a pull-tab as presently known in the field for opening a vessel responsive to pulling action by a user. When the terminal end of the tubing is opened it communicates with atmosphere, permitting the compressed gas to flow from the external chamber through the tubing and into atmosphere. The gas expands as it flows, thereby withdrawing heat from the surrounding beverage in which the tubing is submerged to cool the beverage.

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Hillsboro, OR, United States of America

Michael A Childs