Jsr Corporation

Mibuko Shimada

Toshinori Sakagami

Hiroshi Shiho

Yuichi Hashiguchi

Tarou Kanamori

Tatsuya Shimizu

Takashi Tsubouchi

Katsuya Nagaya

Nakaatsu Yoshimura

Kenji Ishizuki

Michiaki Ando

Kouji Hatakeyama

Yuusuke Murata

Tomohiro Takami

Koji Hatakeyama

Yuuki Suemitsu

Provided is a solid-state imaging device that includes: a first pixel provided with a color filter layer having a transmission band in a visible light wavelength region on a light-receiving surface of a first light-receiving element; a second pixel provided with an infrared pass filter layer having a transmission band in an infrared wavelength region on a light-receiving surface of a second light-receiving element; an infrared cut filter layer that is provided on a position overlapping with the color filter layer and transmits light in the visible light wavelength region by blocking light in the infrared wavelength region; and a cured film provided in contact with the infrared cut filter layer.

Solid-state imaging device, infrared-absorbing composition, and flattened-film-forming curable composition

The present invention intends to provide a solid-state imaging device having minimum production costs and high detection accuracy. A solid-state imaging device includes a first optical layer that transmits visible light and at least a part of near-infrared light, a second optical layer that absorbs at least a part of the near-infrared light and a pixel array that includes a first light-receiving element that detects the visible light transmitted through the first optical layer and the second optical layer and a second light-receiving element that detects the near-infrared light transmitted through the first optical layer, in which the second optical layer has an opening at a part corresponding to the second light-receiving element, the first optical layer includes a compound (A) having at least one absorption maximum at the wavelength of from 750 to 900 nm, the second optical layer includes a compound (B) having at least one absorption maximum at the wavelength of from 755 to 1050 nm, an absorption maximum wavelength on a longest wavelength side of the compound (B) is larger than an absorption maximum wavelength on the longest wavelength side of the compound (A), and a difference between both is from 5 to 150 nm.

Solid-state imaging device

A photosensitive composition, suitable for a hardened film capable of sufficiently blocking light in the visible range and sufficiently transmitting light in the near infrared region, is provided. The photosensitive composition contains a colorant, a compound having an ethylenic unsaturated group, a photopolymerization initiator and a solvent. The colorant contains (A1) to (A3); 

Photosensitive composition, colorant dispersion solution, light filter and light sensor

A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R ) Si(X) , a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.

Polymer composition, cured product, laminate and method for producing the cured product

Disclosed are a coating composition comprising a polymer dispersed in an aqueous medium, the polymer containing (a) a hydrolysate of an organosilane and/or a condensation product thereof and (b) a vinyl polymer containing a silyl group having a silicon atom bound to a hydrolytic group and/or a hydroxyl group, and further comprising (c) an oxazoline derivative as a crosslinking agent and a hardened film obtained therefrom. The above coating composition completes the hardening reaction of a coating film at low temperature for a short period of time, high in hardness immediately after hardening, and having water resistance, weather resistance, organic chemical resistance, acid resistance, alkali resistance, wear resistance and durable adhesion.

Coating composition and hardened film obtained therefrom

A coated film and a coated glass improved in the resistance to fouling derived from water and oil repellency, and in the durability, the abrasion resistance, and the exfoliation of stacked outer layer, are provided by a specific coating composition having at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes, and component (b) containing a silyl group wherein one of silicon atoms bonded with a hydrolytic group and/or a hydroxy group.

Coating composition, and a coated film and glass each having a coating layer comprised thereof

A coating glass which is improved in the resistance to fouling, the durability, and the transparency and has a photocatalytic function is provided by a method of making photocatalyst contained,d coating layers which comprises the steps of forming on the surface of a glass an (under) coating of a coating composition composed mainly of at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes and, when desired, a polymer component (b) having a silyl group containing silicon atoms bonded with a hydrolytic group and/or a hydroxy group, and forming on the (under)coating an (over)coating of a coating composition composed mainly of the component (a), a photocatalyst and, if desired, the component (b).

Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby

A film which is improved in the resistance to fouling, the durability, and the transparency and has a photocatalytic function is provided by a method of making photocatalyst contained coating layers which comprises the steps of forming on the surface of an organic film an (under)coating of a coating composition composed mainly of at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes and, when desired, a polymer component (b) having a silyl group containing silicon atoms bonded with a hydrolytic group and/or a hydroxy group, and forming on the (under)coating an (over)coating of a coating composition composed mainly of the component (a), a photocatalyst and, if desired, the component (b).

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Tokyo, Japan

Mibuko Shimada