Boe Technology Group Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Miao Qiu

Lei Zhang

Lei Chen

Wukun Dai

Zhilong Peng

Fengguo Wang

Jiapeng Li

Ziqi Xia

Xiuhong Jin

The present disclosure provides a method for producing a TFT array substrate, a TFT array substrate, and a display apparatus, and relates to a technical field of display. It can solve a problem of no signal transmission caused by fracture of a source signal line, without increasing a coupling capacitance of the TFT array substrate. The method for producing a TFT array substrate includes: forming a transparent conductive layer and a source-drain metal layer in sequence onto a base substrate; and patterning the source-drain metal layer and the transparent conductive layer in one patterning process to form a source signal line and a pixel electrode line overlapping with each other.

Method for producing TFT array substrate, TFT array substrate, and display apparatus

A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer () by a dry etching. And following the step of patterning a non-metallic layer () by the dry etching, the method further comprises performing surface planarization on a first film layer () to recover the first film layer () with a rough surface caused by the dry etching to be planar. The first film layer () is located below the non-metallic layer ().

Surface planarization method of thin film and preparing method of array substrate

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Beijing, China

Miao Qiu