Auros Technology, Inc.

Mi Ta Park

Jae Jun Lee

There is provided a polarization analysis apparatus that adjusts an angle of incidence or a numerical aperture by using an aperture. The apparatus includes: a first aperture that transmits a lighting beam reflected from a sample on a substrate; a second aperture that transmits a lighting beam having passed through the first aperture; and a detector that detects a lighting beam having passed through the second aperture and selects an angle of incidence of the lighting beam and numerical apertures of the first aperture and the second aperture.

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San Jose, CA, United States of America

Mi Ta Park