Lg Chem, Ltd

Semes Co., Ltd.

Lg Energy Solution, Ltd.

Mi So Park

Seung Hoon Oh

Jin Woo Jung

Sang Min Lee

Young Hun Lee

Yong Hee Lee

Jongmin Park

Yong Sun Ko

Do Hyeon Yoon

Jin Mo Jae

Hyunchul Lee

Yong Hyun Choi

Jong Hyeon Woo

Young Seop Choi

Jong Doo Lee

Tae Jong Choi

The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a liquid treatment chamber configured to treat a substrate with a liquid; a drying chamber configured to dry the liquid-treated substrate; a transfer robot configured to transfer the substrate between the liquid treatment chamber and the drying chamber, and including a hand which is movable along an X-axis, a Y-axis, and a Z-axis and is rotatably driven based on the Z-axis, and on which the substrate is placed; an optical system configured to photograph a form of a liquid film of the substrate, in which when the substrate is transferred from the liquid treatment chamber to the drying chamber, the substrate is wetted with a chemical liquid and is transferred by the transfer robot in a state of being formed with a liquid film formed; and a controller configured to measure the form of the liquid film photographed by the optical system.

Substrate treating apparatus and substrate transfer robot

An apparatus for treating the substrate includes a process chamber having a first body and a second body which are combined with each other to have a treating space in which a substrate is treated, and a friction prevention member placed on a contact surface between the first body and the second body. The friction prevention member may have a groove formed at a surface corresponding to the contact surface. An adhesive for adhering the friction prevention member to the first body or adhering the friction prevention member to the second body may be provided in the groove. The groove may form an open-end pattern in which a first end of the open-end pattern is adjacent to a second end of the open-end pattern.

Apparatus for treating substrate

The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.

Apparatus for treating substrate and method for treating substrate

An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.

Substrate treating apparatus and filler member provided therein

Generating a CAN ID represented by a predetermined bit used in CAN communication, including a first bit allocation process for allocating N-th to M-th bits of the CAN ID for use classification, a second bit allocation process for allocating O-th to P-th bits of the CAN ID for target classification, and a third bit allocation process for allocating Q-th to R-th bits of the CAN ID for data number classification (N, M, O, P, Q and R are integers and satisfy a relation of R&#x3e;Q, P&#x3e;O, M&#x3e;N, N&#x3e;P, O&#x3e;R).

Can communication method between ESS battery and power management device

Disclosed are an apparatus and a method for sensing opening of a current interrupt device (CID) of a battery unit. An apparatus for sensing opening of a current interrupt device of a battery unit according to the present invention is configured to include: a setting unit setting a predetermined voltage section when discharge of one or more battery units starts; a measuring unit measuring a voltage section pass time which is the time when the one or more battery units pass through the predetermined voltage section for each battery unit; and a detecting unit detecting a battery unit in which the current interrupt device (CID) is opened among the one or more battery units and detecting the number of battery cells in which the CID is opened among one or more battery cells included in the battery unit in which the CID is opened based on the voltage section pass time for each battery unit.

Apparatus and method for sensing opening of current interrupt device of battery unit

The present disclosure relates to a battery communication diagnosis method, and more particularly, to a battery communication diagnosis method for diagnosing a state of communication periodically performed between battery management systems (BMSs) in a battery to prevent a message or data from being omitted during communication.

Battery communication diagnosis method

Provided is method of controlling an SOC value and an SOH value of an entire battery pack system in which two or more battery packs are connected in parallel. The method includes: an individual SOC value and SOH value calculation operation for calculating the SOC value and the SOH value of each of the two or more battery packs connected in parallel.

Growing community of inventors

Daejeon, South Korea

Mi So Park