Asml Netherlands B.v.

Menno Fien

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Raymond Wilhelmus Louis Lafarre

Martijn Houben

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Maarten Van Beijnum

Erik Roelof Loopstra

Franciscus Johannes Joseph Janssen

Koen Steffens

Ronald Van Der Ham

Paulus Martinus Maria Liebregts

Wilhelmus Franciscus Johannes Simons

Martijn Houkes

Martinus Agnes Willem Cuijpers

Daniel Jozef Maria Direcks

Gert-Jan Gerardus Johannes Thomas Brands

Evert Hendrik Jan Draaijer

Marcus Joseph Elisabeth Godfried Breukers

Edwin Teunis Van Donkelaar

Arie Cornelis Scheiberlich

Evert H J Draaijer

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

Lithographic apparatus having parts with a coated film adhered thereto

A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

Lithographic apparatus and device manufacturing method

On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

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Tilburg, Netherlands

Menno Fien